Polycrystalline solar cell surface silicon nitride antireflection film preparation method
A silicon nitride reduction and solar cell technology, applied in the field of solar cells, can solve the problems of poor product stability and simple structure of solar cells, and achieve the effect of increasing the refractive index
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[0052] The following are specific embodiments of the present invention and in conjunction with the accompanying drawings, the technical solutions of the present invention are further described, but the present invention is not limited to these embodiments.
[0053] The preparation method of the silicon nitride anti-reflection film on the surface of the polycrystalline solar cell comprises the following steps:
[0054] a. Cleaning, texturing, diffusion and etching of crystalline silicon wafers, treatment of waste gas generated by cleaning texturing and etching through acid mist treatment device, and treatment of exhaust gas generated by diffusion through exhaust treatment device;
[0055] b. Use the crystalline silicon wafer completed in step a to generate a layer of 1-2nm SiO on the surface of the crystalline silicon wafer through an ozone generator 2 Oxide film; in this embodiment, a 1.5nm layer of SiO2 is formed on the surface of the silicon wafer through an ozone generator ...
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