Patents
Literature
Patsnap Copilot is an intelligent assistant for R&D personnel, combined with Patent DNA, to facilitate innovative research.
Patsnap Copilot

32results about How to "Does not affect conversion efficiency" patented technology

Squaring process and application of monocrystal silicon round bar for solar cells

The invention discloses a squaring process of a monocrystal silicon round bar for solar cells. The squaring process comprises the steps that the circumferential radian between a ridge line of the silicon bar and a ridge line of an adjacent crystal support is adjusted to be 2pi/9-5pi/18, and then the monocrystal silicon round bar is squared. The invention further provides a production process of a monocrystal silicon solar cell. The production process comprises the steps of preparation of monocrystal silicon cutting pieces, surface texturing and printing of electrode grid lines. The monocrystal silicon cutting pieces are quasi square silicon slices formed by wire-electrode cutting of cutting pieces by a monocrystal silicon square bar, and the monocrystal silicon square bar is obtained by the monocrystal silicon round bar through the squaring process, and the printed electrode grid lines are parallel to or perpendicular to the edges of the quasi square silicon slices. According to the squaring process of the monocrystal silicon round bar, four monocrystal silicon square bars with the lateral crystal orientations being <110> +/-5 degrees can be obtained, then four monocrystal silicon cutting pieces with the edge crystal orientations being <110> +/- 5 degrees are obtained, the bottom edge of a texturing face pyramid structure formed by conventional texturing of the monocrystal silicon slices can be used for transmitting photoproduction electrons, and route extending of the photoproduction electrons can not happen on the bottom edge of the pyramid structure.
Owner:CHANGZHOU SHICHUANG ENERGY CO LTD

Adaptive line loss compensation circuit for DC-DC (direct current) converter

The invention discloses an adaptive line loss compensation circuit for a DC-DC (direct current) converter. The adaptive line loss compensation circuit comprises an operational amplifier, an NMOS (N-channel metal oxide semiconductor) tube, a low-side current sampling resistor and a compensation resistor, one end of the low-side current sampling resistor and one end of the compensation resistor are jointly grounded, the other end of the low-side current sampling resistor is connected with a CS end, the other end of the compensation resistor is connected with a Vcom end, an in-phase input end of the operational amplifier is connected with the CS end, an inverted input end of the operational amplifier is connected with the Vcom end, an output end of the operational amplifier is connected with a grid electrode of the NMOS tube, a source electrode of the NMOS tube is connected with the Vcom end, and a drain electrode of the NMOS tube is connected with an FB end of the DC-DC converter. The adaptive line loss compensation circuit has the advantages that the conversion efficiency of the DC-DC converter cannot be affected, the adaptive line loss compensation circuit is high in precision and easy to implement, and a full CMOS (complementary metal oxide semiconductor) process can be adopted. The adaptive line loss compensation circuit can be widely applied to the field of integrated circuits.
Owner:SUN YAT SEN UNIV

Monocrystalline silicon cutting piece and solar cell piece with the same

The invention discloses a monocrystalline silicon cutting piece used by a solar cell. The monocrystalline silicon cutting piece is a quasi-square silicon piece formed by cutting a monocrystalline silicon crystal bar. The surface crystal orientation is 100 +/- 3 degrees, and the four margin crystal orientations are 110 +/- 5 degrees. The invention further provides a monocrystalline silicon solar cell piece which comprises an electrode grid line and the monocrystalline silicon cutting piece. The monocrystalline silicon cutting piece forms a texturing face with a pyramid structure by texture making. The electrode grid line and the edge of the monocrystalline silicon cutting piece are in parallel or perpendicular. A pair of bottom sides of the texturing face pyramid structure formed after texture making of the monocrystalline silicon cutting piece is basically perpendicular to the edge of a silicon piece, the bottom sides are basically perpendicular to the normally-printed electrode grind line, the pair of bottom sides of the pyramid structure can be used for transmitting photoproduction electrons, path extension of the photoproduction electrons on the bottom sides of the pyramid structure can be avoided, compared with the prior art, the transmission distance of the photoproduction electrons on the surface of the silicon piece is shortened, electron collecting efficiency is effectively improved, and then cell converting efficiency is improved.
Owner:CHANGZHOU SHICHUANG ENERGY CO LTD

Sulfidizing process for gate lines of solar cell pieces

The invention discloses a sulfidizing process for the gate lines of solar cell pieces. According to the sulfidizing process, heating treatment is carried out on the solar cell pieces with the sulfidized gate lines at a heating temperature of 350+/-10 DEG C for at least 80 seconds, and then cooling to obtain products. The solar cell pieces with the sulfidized gate lines are heated by virtue of a sintering furnace on a solar cell piece production line, the running speed of the conveying belt of the sintering furnace is 250+/-10in/min, the temperature of the drying area of the sintering furnace is 350+/-10 DEG C, the temperature of the sintering area is 450+/-10 DEG C, and the solar cell pieces are arranged on the conveying belt and sequentially pass through the drying area and the sintering area. According to the sulfidizing process disclosed by the invention, after the heating treatment is carried out on the solar cell pieces with the sulfidized gate lines, silver sulphide can be completely decomposed, thus achieving the purposes of achieving sulfidizing removal and avoiding poor appearance, and avoiding influence on the conversion efficiency of the cell pieces. The sulfidizing process disclosed by the invention is simple, low in implementation cost, and beneficial to wide popularization and application.
Owner:JA SOLAR

MIS crystalline silicon solar cell and manufacturing method therefor

The invention discloses an MIS crystalline silicon solar cell and a manufacturing method therefor. The manufacturing method comprises the following steps of: a), texturing the front surface of a silicon wafer; b), performing high-sheet-resistance diffusion on the front surface of the silicon wafer to make a p-n junction; c) removing phosphorosilicate glass from the diffused silicon wafer; d) preparing a tunneling layer on the front surface of the silicon wafer; e) preparing an Al positive electrode on the surface of the tunneling layer; f) preparing an Al back electric field and an Ag back electrode on the back surface of the silicon wafer; g) performing high-temperature sintering on the silicon wafer; and h) depositing an antireflection film in a region outside the Al positive electrode. Compared with the prior art, the method has the following beneficial effects that: the Al positive electrode, the tunneling layer and an N+ layer form an MIS structure, and electrons collected by silicon in the N+ layer can completely penetrate through the insulated tunneling layer to be in contact with the Al positive electrode by an MIS tunneling effect, so that the electrons are exported; the Al positive electrode is not in direct contact with the N+ layer due to the isolation of the tunneling layer, so that the p-n junction is not formed again and the conversion efficiency of the cell is not influenced; and the manufacturing cost can be greatly reduced and the conversion efficiency can be improved.
Owner:GUANGDONG AIKO SOLAR ENERGY TECH

Back electric field structure of MWT solar cell and manufacturing method of back electric field structure

The invention discloses a back electric field structure of an MWT solar cell. The back electric field structure comprises a front silicon nitride film, a silicon dioxide film, a PN junction, a siliconwafer, an aluminum oxide film and a back silicon nitride film which are all sequentially stacked from top to bottom; the front surface of the silicon wafer is provided with positive electrode silvergrid lines and a through hole electrode front surface; the back surface of the silicon wafer is provided with an all-aluminum back surface field, a through hole electrode back surface and uniformly-distributed back electrodes; the all-aluminum back surface field is provided with aluminum grid line back surface fields; through hole isolation grooves are arranged between the aluminum grid line backsurface fields and a back surface through hole electrode. The invention discloses a manufacturing method of the back electric field of the MWT solar cell. The manufacturing method comprises the following steps of: laser drilling; texturing; diffusion; mask printing; etching; annealing; film coating ; back surface laser grooving; screen printing; and sintering. The design mode of combining the all-aluminum back surface field and the aluminum grid lines is realized on the back surface of the MWT cell in ingeniously; the consumption of Al metal slurry is reduced while conversion efficiency not influenced; the influence of Al metal powder residues on the through hole electrode is greatly avoided; and the safe, efficient and continuous operation of the MWT solar cell is ensured.
Owner:HENGDIAN GRP DMEGC MAGNETICS CO LTD

Height-adjustable new-energy photovoltaic bracket and supporting and mounting method thereof

The invention discloses a height-adjustable new-energy photovoltaic bracket and a supporting and mounting method thereof. The height-adjustable new-energy photovoltaic bracket comprises a supporting mechanism, an adjusting mechanism and a photovoltaic panel, wherein the supporting mechanism comprises a base, a supporting column, a horizontal beam and two stand columns; the adjusting mechanism comprises a threaded adjusting rod, a threaded sleeve, two extension rods, two hinge plates and two supporting cross beams; and the photovoltaic panel is located between the two supporting cross beams, afirst inserting column and a second inserting column are fixedly arranged at the center positions of the left end face and the right end face of the photovoltaic panel correspondingly, and the photovoltaic panel is rotatably inserted into the middle sections of the opposite side walls of the two supporting cross beams through the first inserting column and the second inserting column correspondingly. When the photovoltaic panel is installed, the supporting angle of the photovoltaic panel can be adjusted by adjusting the height of the bottom of the front end of the photovoltaic panel, so the photovoltaic panel obtains maximum power generation efficiency, birds can be prevented from nesting or excreting excrement on the photovoltaic panel, and daily receiving of solar illumination of the photovoltaic panel for electric energy conversion operation is not affected.
Owner:安徽铭达智能科技有限公司

A method for reducing cracks in the back electrode region of MWT batteries

The invention discloses a method for reducing hidden cracking of a back electrode region of a MWT (Metal Wrap Technology) battery. In the preparation process of a positive electrode region of a back electrode of the MWT battery, hollow-out and antenna designs are adopted for the positive electrode region; the hollow-out design is that a plurality of non-printing regions are arranged in a middle region of a positive pole printing region, and the antenna design is that a plurality of printing regions are arranged in an edge region of the positive pole printing region; in the preparation processof an aluminium back field, a hollow-out design is adopted for a region of the aluminium back field, which is overlapped with the positive electrode region; and the hollow-out design of the aluminiumback field is that a plurality of non-printing regions are arranged in the overlap region of the aluminium back field and the positive electrode region. The hollow-out design of the positive electroderegion can effectively reduce an overall height of the positive electrode region under the condition of ensuring that a welding area of a component is unchanged, and the antenna design can reduce a coverage area of the overlap region under the condition of effectively ensuring current transmission of the positive electrode region and the aluminium back field. The hollow-out design of the overlapregion of the aluminium back field can reduce a height of the overlap region under the condition of ensuring that an area of the overlap region of the aluminium back field and the positive electrode region is unchanged.
Owner:JIANGSU SUNPORT POWER CORP LTD

Method for reducing hidden cracking of back electrode region of MWT (Metal Wrap Technology) battery

The invention discloses a method for reducing hidden cracking of a back electrode region of a MWT (Metal Wrap Technology) battery. In the preparation process of a positive electrode region of a back electrode of the MWT battery, hollow-out and antenna designs are adopted for the positive electrode region; the hollow-out design is that a plurality of non-printing regions are arranged in a middle region of a positive pole printing region, and the antenna design is that a plurality of printing regions are arranged in an edge region of the positive pole printing region; in the preparation processof an aluminium back field, a hollow-out design is adopted for a region of the aluminium back field, which is overlapped with the positive electrode region; and the hollow-out design of the aluminiumback field is that a plurality of non-printing regions are arranged in the overlap region of the aluminium back field and the positive electrode region. The hollow-out design of the positive electroderegion can effectively reduce an overall height of the positive electrode region under the condition of ensuring that a welding area of a component is unchanged, and the antenna design can reduce a coverage area of the overlap region under the condition of effectively ensuring current transmission of the positive electrode region and the aluminium back field. The hollow-out design of the overlapregion of the aluminium back field can reduce a height of the overlap region under the condition of ensuring that an area of the overlap region of the aluminium back field and the positive electrode region is unchanged.
Owner:JIANGSU SUNPORT POWER CORP LTD

Fabrication method of silicon nitride antireflection film on surface of polycrystalline solar cell

The invention provides a polycrystalline solar cell surface silicon nitride antireflection film preparation method, which solves the technical problems that an existing solar cell is simple in structure, is easy to have continuous attenuation and is poor in product stability. The polycrystalline solar cell surface silicon nitride antireflection film preparation method comprises the following steps: a) carrying out cleaning, texturing, diffusion and etching on a crystalline silicon wafer; b) enabling the crystalline silicon wafer obtained after the step a) to pass through an ozone generation device to generate a 1-2 mm SiO2 oxidation film on the surface of the silicon wafer; c) cleaning a graphite boat through a cleaning device, placing the crystalline silicon wafer obtained after the step b) on the graphite boat, and placing the graphite boat loaded with the wafer to a tubular PECVD for pre-deposition and cleaning; d) carrying out tubular PECVD deposition on the crystalline silicon wafer obtained in the step c); and e) carrying out tubular PECVD deposition again on the crystalline silicon wafer obtained in the step d). The method has the advantages of stable and reliable product.
Owner:ZHEJIANG GUANGLONG ENERGY TECH

A solar cell sheet grid wire vulcanization treatment process

The invention discloses a sulfidizing process for the gate lines of solar cell pieces. According to the sulfidizing process, heating treatment is carried out on the solar cell pieces with the sulfidized gate lines at a heating temperature of 350+ / -10 DEG C for at least 80 seconds, and then cooling to obtain products. The solar cell pieces with the sulfidized gate lines are heated by virtue of a sintering furnace on a solar cell piece production line, the running speed of the conveying belt of the sintering furnace is 250+ / -10in / min, the temperature of the drying area of the sintering furnace is 350+ / -10 DEG C, the temperature of the sintering area is 450+ / -10 DEG C, and the solar cell pieces are arranged on the conveying belt and sequentially pass through the drying area and the sintering area. According to the sulfidizing process disclosed by the invention, after the heating treatment is carried out on the solar cell pieces with the sulfidized gate lines, silver sulphide can be completely decomposed, thus achieving the purposes of achieving sulfidizing removal and avoiding poor appearance, and avoiding influence on the conversion efficiency of the cell pieces. The sulfidizing process disclosed by the invention is simple, low in implementation cost, and beneficial to wide popularization and application.
Owner:JA SOLAR

A height-adjustable new energy photovoltaic support and support installation method

The invention discloses a height-adjustable new energy photovoltaic bracket and a support installation method, including a support mechanism, an adjustment mechanism and a photovoltaic panel. The support mechanism includes a base, a support column, a horizontal beam and two upright columns. The adjustment The mechanism includes a threaded adjustment rod, a threaded sleeve, two extension rods, two hinged plates and two supporting beams, the photovoltaic panel is located between the two supporting beams, and the center positions of the left and right ends of the photovoltaic panel are fixed respectively There are a first plug-in column and a second plug-in column, and the photovoltaic panel is respectively connected to the middle section of the opposite side wall of the two support beams through the first plug-in column and the second plug-in column. When the photovoltaic panel is installed, the height of the bottom of the front end of the photovoltaic panel can be adjusted to meet the adjustment of the supporting angle of the photovoltaic panel, so that the photovoltaic panel can obtain the maximum power generation efficiency and can prevent birds from building nests or excreting feces on the photovoltaic panel , does not affect the photovoltaic panel's daily acceptance of sunlight for electrical energy conversion operations.
Owner:安徽铭达智能科技有限公司

Squaring process and application of monocrystalline silicon rods for solar cells

The invention discloses a squaring process of a monocrystal silicon round bar for solar cells. The squaring process comprises the steps that the circumferential radian between a ridge line of the silicon bar and a ridge line of an adjacent crystal support is adjusted to be 2pi / 9-5pi / 18, and then the monocrystal silicon round bar is squared. The invention further provides a production process of a monocrystal silicon solar cell. The production process comprises the steps of preparation of monocrystal silicon cutting pieces, surface texturing and printing of electrode grid lines. The monocrystal silicon cutting pieces are quasi square silicon slices formed by wire-electrode cutting of cutting pieces by a monocrystal silicon square bar, and the monocrystal silicon square bar is obtained by the monocrystal silicon round bar through the squaring process, and the printed electrode grid lines are parallel to or perpendicular to the edges of the quasi square silicon slices. According to the squaring process of the monocrystal silicon round bar, four monocrystal silicon square bars with the lateral crystal orientations being <110> + / -5 degrees can be obtained, then four monocrystal silicon cutting pieces with the edge crystal orientations being <110> + / - 5 degrees are obtained, the bottom edge of a texturing face pyramid structure formed by conventional texturing of the monocrystal silicon slices can be used for transmitting photoproduction electrons, and route extending of the photoproduction electrons can not happen on the bottom edge of the pyramid structure.
Owner:CHANGZHOU SHICHUANG ENERGY CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products