Preparation of sidewall reflector DUV LED based on3D printing
A 3D printing and mirror technology, applied in electrical components, circuits, semiconductor devices, etc., can solve problems such as limited effect, and achieve the effect of improving production efficiency, improving light output efficiency, and simple production process
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Embodiment 1
[0027] Sapphire is provided as a substrate.
[0028] Step 1: sequentially grow AlN buffer layer, n-AlGaN layer, multi-period Al x Ga 1-x N / Al y Ga 1-y Epitaxial wafer of N active layer (where x<y), p-AlGaN layer and p-GaN contact layer.
[0029] Step 2: Uniformly and parallelly etch micron-scale straight stripes on the epitaxial wafer, the etching depth reaches the n-AlGaN layer, and the distribution density of straight stripes is 5 pieces / mm 2 , and etch the sidewalls formed by the straight stripes to form inclined sidewalls with an inclination angle of 80°.
[0030] Step 3: Write the motion path program of each 3D printing head, put the cleaned epitaxial wafer as a substrate into the 3D printer; use a single or array 3D N-type electrode printing head to print n-type on the exposed n-AlGaN layer electrode.
[0031] Use a single or array 3D P-type electrode print head to print p-type electrodes on the p-GaN contact layer between the straight stripes, the p-type electrode...
Embodiment 2
[0035] Sapphire is provided as a substrate.
[0036] Step 1: sequentially grow AlN buffer layer, n-AlGaN layer, multi-period Al x Ga 1-x N / Al y Ga 1-y Epitaxial wafer of N active layer (where x
[0037] Step 2: Uniformly and parallelly etch micron-scale straight stripes on the epitaxial wafer, the etching depth reaches the n-AlGaN layer, and the distribution density of straight stripes is 50 pieces / mm 2 , and etch the sidewalls formed by the straight stripes to form inclined sidewalls with an inclination angle of 20°.
[0038] Step 3: Write the motion path program of each 3D printing head, put the cleaned epitaxial wafer as a substrate into the 3D printer; use a single or array 3D N-type electrode printing head to print n-type on the exposed n-AlGaN layer electrode.
[0039] Use a single or array 3D P-type electrode print head to print p-type electrodes on the p-GaN contact layer between the straight stripes, the p-type electrod...
Embodiment 3
[0043] Sapphire is provided as a substrate.
[0044] Step 1: sequentially grow AlN buffer layer, n-AlGaN layer, multi-period Al x Ga 1-x N / Al y Ga 1-y Epitaxial wafer of N active layer (where x
[0045] Step 2: Uniformly and parallelly etch micron-scale straight stripes on the epitaxial wafer, the etching depth reaches the n-AlGaN layer, and the distribution density of straight stripes is 30 pieces / mm 2 , and etch the sidewalls formed by the straight stripes to form inclined sidewalls with an inclination angle of 50°.
[0046] Step 3: Write the motion path program of each 3D printing head, put the cleaned epitaxial wafer as a substrate into the 3D printer; use a single or array 3D N-type electrode printing head to print n-type on the exposed n-AlGaN layer electrode.
[0047] Use a single or array 3D P-type electrode print head to print p-type electrodes on the p-GaN contact layer between the straight stripes, the p-type electrod...
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