A system for generating a uniform evanescent wave field

A wave field, uniform technology, applied in the field of guided wave optics, can solve the problems of sample type limitation, unevenness, space unevenness, etc., and achieve the effect of wide applicable surface, uniform field strength, and wide field area.

Inactive Publication Date: 2018-10-26
FUDAN UNIV
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Problems solved by technology

However, since the surface evanescent field is mostly exponentially decaying in spatial distribution, it is not uniform, so that the effect of the excitation is affected by the spatial inhomogeneity
At the same time, due to this exponential attenuation, the effective depth of the evanescent field is very shallow, generally in the order of one wavelength. Therefore, high requirements are placed on the preparation of samples, which also limits the types of samples that can be measured.

Method used

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  • A system for generating a uniform evanescent wave field
  • A system for generating a uniform evanescent wave field
  • A system for generating a uniform evanescent wave field

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Embodiment Construction

[0024] according to figure 1 As shown in the structure, select a laser working wavelength such as: 632.8nm helium-neon laser light source, select two high-refractive index flat materials in the planar refractive index gap structure: the base layer 5 and the cover layer 7 are both glass Material, the refractive index is 1.52, is sandwiched in the interstitial layer 8 of low-refractive-index material, is selected as water, and the refractive index is 1.33, and the thickness of the interstitial layer 8 (water layer) of the low-refractive-index material is d=5 micron; Base layer 5 and cover The thickness of layer 7 is much greater than this, so it can be regarded as infinite, but a finite size (2 microns) is taken in the calculation, and the refractive index distribution of the whole structure is as follows figure 2 shown. The trapezoidal slopes of the base layer 5 and the cover layer 7 are coated with multi-layer dielectric anti-reflection coatings, and the transmittance is no...

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Abstract

The invention belongs to the technical field of guided wave optics, and particularly relates to a system for generating a uniform evanescent wave field. The system provided by the invention comprises a refractive index gap structure and a light beam guide mechanism; the refractive index gap structure is a planar three-layer structure composed of two flat panel materials having high refractive indexes and trapezoidal cross sections and a low refractive index layer sandwiched between the flat panel materials; a beam of laser is symmetrically guided into the two high refractive index layers in the refractive index gap after being split by the light beam guide mechanism and symmetrically irradiates the interface of the low refractive index layer, and an angle of incidence is equal to a total internal reflection angle; and the strength and phases of the two beams of laser are adjusted by a variable beam splitter and a phase retarder. By adopting the system provided by the invention, the uniform evanescent wave field can be generated in the low refractive index layer, and can be applied to micro-nano structure analysis or sensing application of materials.

Description

technical field [0001] The invention belongs to the technical field of guided wave optics, and in particular relates to a system for generating a uniform evanescent wave field. Background technique [0002] In the microstructure analysis of materials, Raman scattering and fluorescence are two effective analysis methods. With the help of planar optical waveguide technology, the surface evanescent field can be generated to excite the sample to be analyzed. However, since the surface evanescent field is mostly exponentially decaying spatially distributed, it is not uniform, so that the excitation effect is affected by the spatial inhomogeneity. At the same time, due to this exponential attenuation, the effective depth of the evanescent field is very shallow, generally in the order of one wavelength. Therefore, high requirements are placed on the preparation of samples, which also limits the types of samples that can be measured. Therefore, it is urgent to study methods that c...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01S5/028H01S5/10
CPCH01S5/028H01S5/10
Inventor 刘建华张克陶李
Owner FUDAN UNIV
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