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Analysis and detection method for high purity indium

A detection method and high-purity technology, applied in the direction of analyzing materials, material analysis by electromagnetic means, measuring devices, etc., can solve the problems of low impurity content, inability to separate the matrix impurity analysis and detection, etc., to reduce the residual amount and the detection speed. Fast and accurate results

Active Publication Date: 2016-09-21
ZHUZHOU KENENG NEW MATERIAL CO LTD
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Problems solved by technology

However, for 6N and above high-purity indium, due to the low impurity content, it is impossible to use the method of not separating the matrix for impurity analysis and detection

Method used

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  • Analysis and detection method for high purity indium
  • Analysis and detection method for high purity indium
  • Analysis and detection method for high purity indium

Examples

Experimental program
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Effect test

Embodiment 1

[0035] 1) Purification of ammonia water by diffusion method, the schematic diagram of the free diffusion device is as follows figure 1 shown.

[0036] On a clean polytetrafluoroethylene plate with grooves all around, fill the ammonia water to be purified with a large polytetrafluoroethylene beaker cup, and place a polytetrafluoroethylene beaker filled with pure water at the adjacent position, Cover the PTFE sealing cover, place the lower edge of the PTFE sealing cover in the groove of a clean PTFE sheet with grooves around it, fill the groove with a small amount of pure water to seal, and wait for a certain period of time ( Usually 1 week), put the ammonia water in the Teflon beaker into a clean Teflon bottle for later use.

[0037] ICP-MS detection of ammonia quality:

[0038] Table 1 Comparison of impurity content before and after ammonia water purification

[0039]

[0040]

[0041]

[0042] 2) Nitric acid is purified by sub-boiling distillation, and the schemat...

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Abstract

The invention discloses an analysis and detection method for high purity indium. The analysis and detection method includes the steps that ammonia water is prepared into ultra-pure ammonia water with the free diffusion method; nitric acid is prepared into ultra-pure nitric acid with the sub-boiling distillation method; high purity indium with the grade of 6N or above is dissolved with the ultra-pure nitric acid, then nitrogen oxide is removed through heating, the product is cooled, diluted with water and heated, the ultra-pure ammonia water is added dropwise, stirring and reacting are carried out, the pH value of 2 to 10 of the system serves as the reaction endpoint, and standing clarifying or centrifugal separation is carried out; supernatant liquid is taken, volatilized and concentrated, then the concentrated product is dissolved with the ultra-pure nitric acid, internal standard substances are added, constant volume is achieved, and to-be-detected liquid is obtained; According to ICP-MS measurement, the method is easy to operate, high in sensitivity, good in accuracy and specially suitable for detection of the purity of the high purity indium with the grade of 6N or above.

Description

technical field [0001] The invention relates to a detection and analysis method for high-purity indium, in particular to an analysis and detection method for high-purity indium above 6N, and belongs to the technical field of metal detection. Background technique [0002] The development and application of new functional materials in modern material science, among which high-purity indium and its compounds, especially the development and application of a large number of semiconductor materials such as InP, InAs, and InSb, especially the rapid development of the electronics industry in recent years, has further promoted high Research and development of pure indium. Because certain impurity elements have a great influence on the electrical properties of high-purity indium compound semiconductors, the quality control of high-purity indium is very important. In the production process, it involves the direction of impurities in the preparation process and the degree of removal of...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N27/62G01N1/28G01N1/40
CPCG01N1/28G01N1/40G01N27/62
Inventor 赵科湘赵家浩
Owner ZHUZHOU KENENG NEW MATERIAL CO LTD
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