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A kind of moisturizing anti-allergic repair mask and preparation method thereof

An anti-allergic and facial mask technology, which is applied in pharmaceutical formulations, cosmetic preparations, cosmetic preparations, etc., can solve problems such as skin irritation and damage to skin barrier function

Active Publication Date: 2020-08-21
GENERAL HOSPITAL OF PLA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, the ingredients of most beauty products are chemical synthetic preparations. Although they have the effects of moisturizing the skin, whitening and beautifying the skin, and removing wrinkles to a certain extent, they contain various chemical additives such as essences and pigments. They are used when the skin barrier function is damaged. , may irritate the skin, cause skin flushing, pimples, itching, stinging and other allergic symptoms, and further damage the skin barrier function

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0036] The moisturizing anti-allergy repair mask contains the following components by weight percentage: 0.03% macromolecular hyaluronic acid, 0.03% medium molecular hyaluronic acid, 0.03% small molecular hyaluronic acid, 0.5% urea, 2% ceramide, niacinamide 2 %, polydimethylsiloxane 5%, glycerin 0.5%, butylene glycol 1%, boric acid 2%, green tea extract polyphenols 1%, and the rest is deionized water. This weight ratio formula is a better proportion obtained after repeated tests of the present invention.

[0037] The molecular weight of macromolecular hyaluronic acid is greater than or equal to 1,800,000 and less than or equal to 2,200,000; the molecular weight of medium molecular hyaluronic acid is greater than or equal to 1,000,000 and less than 1,800,000; the molecular weight of small molecular hyaluronic acid is greater than or equal to 400,000 and less than 1,000,000.

[0038] Butanediol is 1,3 butanediol.

[0039] The ceramide is ceramide 3.

[0040] The green tea extr...

Embodiment 2

[0051] The moisturizing anti-allergic repair mask contains the following components by weight percentage: macromolecular hyaluronic acid 0.08%, medium molecular hyaluronic acid 0.03%, small molecular hyaluronic acid 0.045%, urea 1.35%, ceramide 3.3%, nicotinamide 3.4% %, polydimethylsiloxane 8.5%, glycerin 0.3%, butanediol 0.45%, boric acid 3.75%, green tea extract polyphenols 2.1%, and the rest is deionized water.

[0052] The molecular weight of macromolecular hyaluronic acid is greater than or equal to 1,800,000 and less than or equal to 2,200,000; the molecular weight of medium molecular hyaluronic acid is greater than or equal to 1,000,000 and less than 1,800,000; the molecular weight of small molecular hyaluronic acid is greater than or equal to 400,000 and less than 1,000,000.

[0053] Butanediol is 1,3 butanediol.

[0054] The ceramide is ceramide 3.

[0055] The green tea extract tea polyphenols contain catechin, gallocatechin, epicatechin gallate, and epigallocatech...

Embodiment 3

[0058] The moisturizing anti-allergy repair mask contains the following components by weight percentage: 0.01% macromolecular hyaluronic acid, 0.01% medium molecular hyaluronic acid, 0.01% small molecular hyaluronic acid, 0.15% urea, 0.6% ceramide, 0.6% nicotinamide %, polydimethylsiloxane 1.5%, glycerin 0.3%, butanediol 0.3%, boric acid 0.6%, green tea extract polyphenols 0.3%, and the rest is deionized water.

[0059] The molecular weight of macromolecular hyaluronic acid is greater than or equal to 1,800,000 and less than or equal to 2,200,000; the molecular weight of medium molecular hyaluronic acid is greater than or equal to 1,000,000 and less than 1,800,000; the molecular weight of small molecular hyaluronic acid is greater than or equal to 400,000 and less than 1,000,000.

[0060] Butanediol is 1,3 butanediol.

[0061] The ceramide is ceramide 3.

[0062] The green tea extract tea polyphenols contain catechin, gallocatechin, epicatechin gallate, and epigallocatechin g...

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PUM

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Abstract

The invention relates to an anti-allergic mask with moisturizing and repairing functions. The mask is prepared from macromolecular hyaluronic acid, intermediate-molecular hyaluronic acid, micromolecular hyaluronic acid, urea, ceramide, nicotinamide, polydimethylsiloxane, glycerin, butanediol, boric acid, green tea extract-tea polyphenol and deionized water through mixing. The components of the mask do not contain perfume and are non-irritating to skin, effective ingredients of the mask can rapidly permeate into the skin, a good moisturizing effect is realized, and the mask has the functions of being resistant to inflammation and allergy, calming and repairing the skin and restoring the skin barrier.

Description

technical field [0001] The invention relates to the technical field of facial beauty care, in particular to a moisturizing, anti-allergy repairing facial mask and a preparation method thereof. Background technique [0002] With the development of the economy and the continuous improvement of people's living standards, people pay more and more attention to their appearance, so beauty products have become a must-have in daily life. Mask is a carrier of beauty care products. It is applied on the face for 15 to 30 minutes. During the contact process with the skin, the ingredients contained in the mask will have beauty effects (such as moisturizing, firming, etc.). At present, the ingredients of most beauty products are chemical synthetic preparations. Although they have a certain degree of moisturizing, whitening and beautifying, anti-wrinkle and other effects, they contain various chemical additives such as flavors and pigments. They are used when the skin barrier function is d...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): A61K8/9789A61K8/19A61K8/42A61K8/67A61K8/68A61K8/73A61K8/891A61Q19/00
CPCA61K8/19A61K8/42A61K8/675A61K8/68A61K8/735A61K8/891A61K8/97A61K2800/72A61Q19/00
Inventor 解方李承新
Owner GENERAL HOSPITAL OF PLA
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