A kind of thin film transistor and its manufacturing method, array substrate, display panel
A technology of thin film transistors and array substrates, applied in the direction of transistors, etc., can solve the problems of small conduction current and unsatisfactory adjustment effect, and achieve the effects of increasing the number, increasing light transmittance, and increasing light intensity
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Embodiment 1
[0041] As shown in Figure 3(a), the thin film transistor provided by the specific embodiment of the present invention includes: a base substrate 30, a gate electrode 21 with several hollowed-out areas on the base substrate 30, a transparent conductive substance filled in the hollowed-out areas 211 , the electrochromic layer 31 located on the transparent conductive object 211 , the semiconductor active layer 32 located on the electrochromic layer 31 , the source electrode 14 and the drain electrode 15 . The specific arrangement of the semiconductor active layer 32 , the source 14 and the drain 15 of the thin film transistor in the specific embodiment of the present invention is similar to that of the prior art, and will not be repeated here.
[0042] The base substrate 30 in the specific embodiment of the present invention is a glass substrate. Of course, in the actual production process, the base substrate 30 can also be other types of substrates such as plastic substrates. The...
Embodiment 2
[0050] As shown in Figure 3(b), the thin film transistor provided by the specific embodiment of the present invention includes: a base substrate 30, a gate electrode 21 with several hollowed-out areas located on the base substrate 30, and an electrochromic electrode 21 filled in the hollowed-out areas. Layer 31, an insulating layer 34 positioned on the electrochromic layer 31, a semiconductor active layer 32 positioned on the insulating layer 34, a source electrode 14 and a drain electrode 15, the electrochromic layer 31 in a specific embodiment of the present invention adopts a conductive The electrochromic material, the insulating layer 34 adopts the insulating material commonly used in the prior art, such as: the insulating layer 34 adopts a single-layer film of silicon oxide or silicon nitride, and can also adopt a composite film of silicon oxide and silicon nitride. The specific embodiment does not limit the specific material of the insulating layer 34 .
[0051] Specific...
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