Making method of large-caliber film diffraction element with high diffraction efficiency
A diffraction efficiency and diffraction element technology, applied in optical elements, diffraction gratings, optics, etc., can solve the problems of complex preparation process, low process repeatability, and high manufacturing cost, and achieve good repeatability, low alignment accuracy requirements, and low cost. low effect
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[0118] Example 1:
[0119] see image 3 , which is a schematic diagram of the specific process of step 1 with 16 steps (m=4). figure 2 contains 2 4 Quartz relief structure with 10 steps (ie 16 steps). The diffraction efficiency of the 16-step element prepared by the method of the present invention is above 95%
[0120] in, figure 2 The meanings of p1, p2, p3 and p4 are as follows: the unetched steps under the protection of the Cr film are represented by p1 and p3 respectively. One or more continuous steps that have been etched are regarded as a whole, and are represented by p2 and p4 respectively. Consider the four parts p1, p2, p3, and p4 as periodic structures; image 3 The schematic diagram of the production process of quartz substrate with 16-step relief structure is shown in image 3 The meanings of the serial numbers in (1) are: 1 is a mask, 2 is a positive photoresist, 3 is a Cr film, 4 is a quartz substrate, and 5 is a negative photoresist as an additional pro...
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