Making method of large-caliber film diffraction element with high diffraction efficiency
A diffraction efficiency and diffraction element technology, applied in optical elements, diffraction gratings, optics, etc., can solve the problems of complex preparation process, low process repeatability, and high manufacturing cost, and achieve good repeatability, low alignment accuracy requirements, and low cost. low effect
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[0119] see image 3 , which is a schematic diagram of the specific process of step 1 containing 16 steps (m=4). figure 2 is containing 2 4 steps (that is, 16 steps) of the quartz relief structure. The diffraction efficiency of the 16-step element prepared by the method of the present invention is above 95%
[0120] in, figure 2 The meanings of p1, p2, p3, and p4 in are as follows: the unetched steps under the protection of the Cr film are respectively represented by p1 and p3. One or more continuous steps that have been etched are regarded as a whole, denoted by p2 and p4 respectively. Consider the four parts p1, p2, p3, and p4 as periodic structures; image 3 Schematic diagram of the fabrication process for a quartz substrate with a 16-step relief structure, in image 3 The meanings of the serial numbers in (1) are respectively: 1 is a mask, 2 is a positive photoresist, 3 is a Cr film, 4 is a quartz substrate, and 5 is a negative photoresist as an additional protectiv...
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