Gas distribution and diffusion plate and plasma processor
A gas distribution and diffusion plate technology, used in semiconductor/solid-state device manufacturing, electrical components, discharge tubes, etc., can solve the problems of unstable wafer processing process, unstable surface temperature of gas distribution diffusion plate, etc., to improve quality and performance, ensuring stability, and improving product yield
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Example Embodiment
[0025] In order to make the objectives and technical effects of the present invention clearer and more complete, the specific embodiments of the present invention will be described below with reference to the accompanying drawings.
[0026] The inventor has discovered through research that in the prior art, the gas distribution diffusion plate used in the reaction chamber is usually formed from a whole metal plate, and there is no temperature measurement and temperature control device inside. In the reaction chamber, the factors affecting the surface temperature of the gas distribution diffuser mainly include: the heat of the wafer carrier used to heat the wafer at the bottom of the reaction chamber and the heat radiated by the plasma source on the top of the reaction chamber. However, during the entire process, from the robot arm sending the wafer into the reaction chamber to the end of the process, the temperature of the surface of the gas distribution diffuser is following the ...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap