Method for detecting deep ultraviolet laser radiation induction surface change of CaF2 optical substrate

Abstract

The invention discloses a method for detecting a deep ultraviolet laser radiation induction surface change of a CaF2 optical substrate. The method comprises the following steps: S1, carrying out a Raman spectrum test on a focus area of a CaF2 optical element by using a micro Raman spectroscopy, selecting a Raman spectrum test mode and setting a Raman spectrum test parameter; S2, selecting a fluorescence spectrum test mode and a fluorescence spectrum test parameter by the micro Raman spectroscopy, and carrying out a fluorescence spectrum test on the focus area of a sample; S3, carrying out a Mapping surface scanning test on all irradiated areas of the surface of the tested CaF2 optical element; S4, analyzing test results and judging whether all irradiated areas of the surface of the tested CaF2 optical element change. The method for detecting the deep ultraviolet laser radiation induction surface change of the CaF2 optical substrate provided by the invention can improve the detection precision and the detection accuracy.

Description

technical field [0001] The invention relates to the field of surface detection of optical components, in particular to a CaF 2 Method for detecting surface changes induced by deep ultraviolet laser radiation on optical substrates. Background technique [0002] In recent years, deep ultraviolet lasers including ArF excimer lasers have been used in industrial applications including fine microprocessing of materials, deep ultraviolet lithography, material processing, laser marking, etc., excimer laser medical treatment, and scientific research and many other fields. They have been widely used more and more, especially in the field of photolithography preparation of very large scale integrated circuits, which have very important social and economic value. It is foreseeable that with the continuous development of the economy and society, deep ultraviolet lasers including ArF excimer lasers will gain more and more in-depth applications. [0003] Since the deep ultraviolet band i...

AI Technical Summary

Problems solved by technology

In the actual test, the differential interference microscopy method has the following two shortcomings: when the radiation point damage of the sample is not obvious, its damage morphology is difficult to be accurately located in the off-line microscope; due to its relatively weak illumination intensity and the focus of the observation surface The problem is that when the magnification exceeds 100 times, the clarity of the microscopic imaging will degrade, making it difficult to observe and accurately judge the surface topography, and it is difficult to observe and judge smaller or weak damage topography

Obviously, the current international standard ISO 21254 cannot well meet the needs of this application

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