Preparation apparatus and method of ultra-low roughness tungsten probe

A preparation device and roughness technology, which is applied in the field of preparation devices for ultra-low roughness tungsten probes, can solve problems such as high stability requirements, increased corrosion system construction costs, and inability to accurately control the length-to-diameter ratio. Easy to operate and prevent excessive corrosion

Inactive Publication Date: 2017-03-15
XI AN JIAOTONG UNIV
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

However, unidirectional dynamic corrosion cannot accurately control the length-to-diameter ratio because it cannot effectively calibrate the broken needle; The stability requirements are high, which will increase the construction cost of the corrosion system and reduce the operability of the corrosion system

Method used

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  • Preparation apparatus and method of ultra-low roughness tungsten probe
  • Preparation apparatus and method of ultra-low roughness tungsten probe
  • Preparation apparatus and method of ultra-low roughness tungsten probe

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Embodiment Construction

[0032] Below in conjunction with accompanying drawing, the present invention is described in further detail:

[0033] A preparation device for an ultra-low roughness tungsten probe, comprising a shock absorbing platform 8, the shock absorbing platform 8 is an optical shock absorbing flat plate, the shock absorbing platform 8 is connected with an L-shaped fixing bracket 6, and the L-shaped fixing bracket 6 is connected with a useful For the motion control system that drives the tungsten wire 9 to move, the motion control system includes a track that is arranged on the L-shaped fixed bracket 6 and is perpendicular to the shock-absorbing platform 8. A slider is arranged in the track, and a slider is connected to the slider for driving the slider along the track. The stepping motor 2 of the orbital motion, the tungsten wire 9 is connected to the bottom of the stepping motor 2 through the tungsten wire clamp 5, the container 4 containing the corrosive solution is also arranged on th...

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Abstract

The invention discloses a preparation apparatus and method of an ultra-low roughness tungsten probe. The preparation apparatus of an ultra-low roughness tungsten probe includes a damping platform, wherein the damping platform is connected with an L type fixed support; the L type fixed support is connected with a motion control system for driving motion of a tungsten filament; the damping platform is also provided with a container filled with etchant solution; the container filled with etchant solution is arranged just below the tungsten filament; a copper ring counter electrode is arranged in the container filled with etchant solution; a counter electrode isolation system is also arranged in the container filled with etchant solution, and is used for isolating the copper ring counter electrode from the tungsten filament; and the copper ring counter electrode and the tungsten filament are respectively connected with the cathode and anode of a digital control DC source. Based on a dynamic electrochemical corrosion principle, the preparation apparatus and method of an ultra-low roughness tungsten probe. The preparation apparatus of an ultra-low roughness tungsten probe can prepare an ultra-low roughness tungsten probe on the premise of effectively controlling the contour and the ratio length/diameter ratio of the probe point.

Description

technical field [0001] The invention relates to a preparation device and method of a tungsten probe, in particular to a preparation device and method of an ultra-low roughness tungsten probe. Background technique [0002] Due to its good strength and rigidity, the tungsten probe is not easy to bend during mechanical operation, and has good electrical and thermal conductivity, making it suitable for electrochemical analysis, material microstructure analysis (STM, AFM), and life science analysis. , Electrical performance testing system has been widely used. Especially in the analysis of material microstructure and life science analysis, in addition to the higher requirements for the tip of the tungsten probe (the smaller the tip curvature radius, the more symmetrical the shape, the higher the resolution and image quality), the tungsten probe Surface roughness also places high demands. The lower the surface roughness of the tungsten needle, the less damage to the biological m...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01Q60/60
CPCG01Q60/60
Inventor 成永红董承业门闯孟国栋王科镜高新宇
Owner XI AN JIAOTONG UNIV
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