OLED substrate and manufacturing method thereof
一种制作方法、基板的技术,应用在最终产品制造、可持续制造/加工、半导体/固态器件制造等方向,能够解决像素定义层的表面疏水性不够理想、工艺复杂、混色等问题,达到优异疏水特性、色纯度高的效果
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[0032] In order to further illustrate the technical means adopted by the present invention and its effects, the following describes in detail in conjunction with preferred embodiments of the present invention and accompanying drawings.
[0033] see figure 1 , the invention provides a method for manufacturing an OLED substrate, comprising the following steps:
[0034] Step 1, such as figure 2 As shown, a base substrate 10 is provided, and a pixel definition layer 20 is formed on the base substrate 10, and several through holes 21 are arranged on the pixel definition layer 20, and the several through holes 21 are formed on the base substrate. Several pixel areas 11 are respectively defined on 10 .
[0035] Specifically, the base substrate 10 is a TFT substrate.
[0036] Specifically, the material of the pixel definition layer 20 is common organic photoresist, and the common organic photoresist material has a certain degree of hydrophobicity, but the hydrophobicity is poor en...
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