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Moisturizing mask

A technology of mask liquid and mask paper, applied in the direction of cosmetics, cosmetic preparations, dressing preparations, etc., can solve the problems of skin moisture loss, unsustainable effect, dullness, etc., to improve skin quality, lighten dark spots, Fair and bright skin effect

Inactive Publication Date: 2017-06-13
刘泽华
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Air-conditioning, environmental pollution, temperature changes and pressure caused by seasonal changes, as well as skin aging and metabolic slowdown, will all cause skin moisture loss, make skin rough, dull, dry lines, and cause many skin problems. Hydration is essential for every day. A beauty-loving lady is very important, but the current traditional facial masks can only achieve a short-term moisturizing effect, not a long-lasting effect, and the performance is single, which cannot meet the needs of current consumers

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0008] The hydrating facial mask described in this embodiment includes a facial mask liquid and a facial mask paper, wherein the facial mask liquid contains the following components in mass percent: 7% small molecule hyaluronic acid, 3% tranexamic acid, 5% white tea extract, barley extract 5% liquid, 4% zinc oxide, 5% peony extract, 1% ceramide, 7% chamomile extract, 2% orchid extract, 4% L-vitamin, and the balance is deionized water.

[0009] The mask paper can adopt 384 ultra-thin silk mask cloth.

Embodiment 2

[0011] The hydrating facial mask described in this embodiment includes facial mask liquid and facial mask paper, wherein the facial mask liquid contains the following components in mass percentage: 10% small molecule hyaluronic acid, 5% tranexamic acid, 10% white tea extract, barley extract Liquid 7%, zinc oxide 6%, peony extract 8%, ceramide 3%, chamomile extract 7%, orchid extract 4%, L-vitamin C 4%, and the balance is deionized water.

[0012] The mask paper can adopt 384 ultra-thin silk mask cloth.

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PUM

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Abstract

The invention relates to the field of masks, in particular to a moisturizing mask. The moisturizing mask comprises a mask liquid and mask paper, wherein the mask liquid contains the components in percentage by mass: 7-10% of small molecule hyaluronic acid, 3-5% of tranexamic acid, 5-10% of a white tea extracting solution, 5-7% of a barley extracting solution, 4-6% of zinc oxide, 5-8% of a peony extracting solution, 1-3% ceramide, 4-7% of a chamomile extracting solution, 2-4% of an orchid extracting solution, 3-4% of L-vitamin C and the balance of deionized water. The moisturizing mask provided by the invention can deeply supplement moisture to skins, moisturize skins, remove wrinkles, enable devitalized skins to be tight, lighten dark spots, make skin white and bright and effectively improve skin quality.

Description

technical field [0001] The invention relates to the field of facial masks, in particular to a moisturizing facial mask. Background technique [0002] Skin care has become a science in modern times, and now people are paying more and more attention to skin care issues, and facial masks also play a big role in our skin care process. The principle of the mask is to use the short time covered on the face to temporarily isolate the outside air and pollution, increase the temperature of the skin, expand the pores of the skin, promote the secretion and metabolism of sweat glands, increase the oxygen content of the skin, and help the skin to eliminate the skin. The products of cell metabolism and accumulated oily substances, the moisture in the mask penetrates into the stratum corneum of the epidermis, the skin becomes soft, and the skin is naturally bright and elastic. Air-conditioning, environmental pollution, temperature changes and pressure caused by seasonal changes, as well a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/9794A61K8/9789A61K8/02A61K8/27A61K8/44A61K8/67A61K8/68A61K8/73A61Q19/00A61Q19/02A61Q19/08
CPCA61K8/735A61K8/0212A61K8/27A61K8/44A61K8/676A61K8/68A61K8/97A61Q19/007A61Q19/02A61Q19/08
Inventor 刘泽华
Owner 刘泽华
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