High-temperature-resistant cable sheath and preparation method thereof
A cable sheath and high-temperature-resistant technology, which is applied in the field of high-temperature-resistant cable sheath and its preparation, can solve problems such as easy softening and cracking, and poor high-temperature resistance of the insulation skin, and achieves hard softening and cracking, excellent high-temperature resistance, and a simple method Effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0017] 100g of polyvinyl chloride, 80g of polypropylene, 30g of ethyl acetate, 1g of plasticizer, 20g of calcium carbonate and 2g of stabilizer were mixed and melted (the melting temperature was 150°C and the time was 15min) to form a molten liquid M; After the molten liquid M is subjected to an injection molding process, the high temperature resistant cable sheath is obtained.
Embodiment 2
[0019] 100g of polyvinyl chloride, 90g of polypropylene, 50g of ethyl acetate, 10g of plasticizer, 30g of calcium carbonate and 8g of stabilizer were mixed and melted (the melting temperature was 200°C and the time was 20min) to form a molten liquid M; After the molten liquid M is subjected to an injection molding process, the high temperature resistant cable sheath is obtained.
Embodiment 3
[0021] 100g of polyvinyl chloride, 85g of polypropylene, 40g of ethyl acetate, 5g of plasticizer, 25g of calcium carbonate and 5g of stabilizer were mixed and melted (the melting temperature was 180°C and the time was 18min) to form a molten liquid M; After the molten liquid M is subjected to an injection molding process, the high temperature resistant cable sheath is obtained.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com