A kind of preparation method of high-performance anti-reflection film
An anti-reflection film, high-performance technology, applied in the direction of climate sustainability, final product manufacturing, sustainable manufacturing/processing, etc. Problems such as poor friction ability, achieve the effects of orderliness and low packing density, low production cost, and anti-reflection effect
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Embodiment 1
[0030] A method for preparing a high-performance antireflection film, the preparation steps of which are as follows:
[0031] Step 1, adding ethyl silicate to absolute ethanol, stirring evenly, adding a stabilizer to form a stable sol;
[0032] Step 2, slowly adding ethylene-vinyl acetate copolymer and curing agent into the sol solution, and ultrasonically dispersing for 10 minutes to form a viscous dispersion;
[0033] Step 3, soak the silicon wafer in the viscous dispersion liquid, then seal the micro-boiling reaction for 1 hour, and take out the silicon wafer after natural cooling;
[0034] Step 4, putting the coated silicon wafer into a muffle furnace for drying, and then cooling naturally to form a uniform film layer;
[0035] Step 5, adding polyvinylpyrrolidone to distilled water, stirring until completely dissolved, then adding nano-silicon carbide, penetrating agent and foaming agent to form a suspension;
[0036] In step 6, put the silicon wafer in step 4 into the s...
Embodiment 2
[0049] A method for preparing a high-performance antireflection film, the preparation steps of which are as follows:
[0050] Step 1, adding ethyl silicate to absolute ethanol, stirring evenly, adding a stabilizer to form a stable sol;
[0051] Step 2, slowly adding ethylene-vinyl acetate copolymer and curing agent into the sol solution, and ultrasonically dispersing for 15 minutes to form a viscous dispersion;
[0052] Step 3, soak the silicon chip in the viscous dispersion liquid, then seal the micro-boiling reaction for 2 hours, and take out the silicon chip after natural cooling;
[0053] Step 4, putting the coated silicon wafer into a muffle furnace for drying, and then cooling naturally to form a uniform film layer;
[0054] Step 5, adding polyvinylpyrrolidone to distilled water, stirring until completely dissolved, then adding nano-silicon carbide, penetrating agent and foaming agent to form a suspension;
[0055] In step 6, put the silicon wafer in step 4 into the su...
Embodiment 3
[0068] A method for preparing a high-performance antireflection film, the preparation steps of which are as follows:
[0069] Step 1, adding ethyl silicate to absolute ethanol, stirring evenly, adding a stabilizer to form a stable sol;
[0070] Step 2, slowly adding ethylene-vinyl acetate copolymer and curing agent into the sol solution, and ultrasonically dispersing for 15 minutes to form a viscous dispersion;
[0071] Step 3, soak the silicon chip in the viscous dispersion liquid, then seal the micro-boiling reaction for 2 hours, and take out the silicon chip after natural cooling;
[0072] Step 4, putting the coated silicon wafer into a muffle furnace for drying, and then cooling naturally to form a uniform film layer;
[0073] Step 5, adding polyvinylpyrrolidone to distilled water, stirring until completely dissolved, then adding nano-silicon carbide, penetrating agent and foaming agent to form a suspension;
[0074] Step 6, put the silicon wafer in step 4 into the suspe...
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