Chemical liquid plasma treatment method and equipment
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- 苏州久华水处理科技有限公司
- Publication Date
- 2017-08-18
- Estimated Expiration
- Not applicable · inactive patent
Smart Images

Figure 1 
Figure 2 
Figure 3
Abstract
Description
technical field
[0001] The invention relates to the technical field of chemical liquid treatment, in particular to a chemical liquid plasma treatment method and equipment. Background technique
[0002] Plasma is the fourth state of matter, which is an ionized gas composed of a large number of free electrons and ions, and is generally electrically neutral. Plasma can generate a large number of OH·free radicals during discharge, and OH·free radicals can induce a series of free radical chain reactions, which can then be applied to sewage treatment. OH free radicals have large-scale chain reaction capabilities, react quickly and without selectivity, can attack various pollutants in water, degrade them into carbon dioxide, water or other mineral salts, can effectively remove organic matter in sewage, and do not There will be secondary pollution. Some chemical reactions that cannot be carried out under "three-state" conditions can be carried out in the plasma state. Plasma trea...