Production Apparatus And Production Method For Fine Particles

Abstract

A production apparatus for fine particles includes a vacuum chamber, a material feeding device connected to the vacuum chamber and feeding material particles from a material feeding port into the vacuum chamber, electrodes arranged in the vacuum chamber for generating plasma and a fine particle collection device connected to the vacuum chamber and collecting fine particles. The fine particles are produced from the material by generating electric discharge inside the vacuum chamber. The apparatus includes an inner chamber which forms an outside space with respect to the vacuum chamber installed between a wall of the vacuum chamber and a plasma generation region and gas supply pipes which supply a gas to the outside space between the wall of the vacuum chamber and a wall of the inner chamber.

Description

technical field [0001] The present invention relates to a microparticle production apparatus and a microparticle production method, which are used, for example, as electrode materials for lithium ion batteries, coating materials such as film materials for food packaging, and ink materials used in electronic device wiring. Background technique [0002] In recent years, applications of nanoscale fine particles to various devices have been considered. For example, metal fine particles of nickel are currently used in ceramic capacitors, and the use of fine particles having a particle diameter of 200 nm or less and good dispersibility is considered for next-generation ceramic capacitors. [0003] Furthermore, silicon monoxide (SiO) with a lower oxygen content than silicon dioxide x : x = 1 to 1.6) are effectively used as an antireflection film for an optical lens or a vapor deposition material for a gas barrier film for food packaging. Recently, applications to negative electro...

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Problems solved by technology

[0010] Using the above-mentioned existing microparticle manufacturing device (refer to Figure 4 ) to produce microparticles, there is a space between the plasma 212 and the device wall, and the gas flows in one direction, so it is difficult to control the flow

Therefore, it will cause the diffusion of the generated particles and the re-input into the plasma. In order to reduce the recovery amount and generate thermal plasma, the conversion efficiency of the input electric energy into heat will decrease, and the production efficiency of the particles will deteriorate.

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