Processing method of microreactor and microreactor

A technology of micro-reactor and processing method, which is applied in chemical instruments and methods, chemical/physical/physical-chemical processes, chemical/physical processes, etc., and can solve the problem of low yield rate of processed products, high price of silicon carbide, and inability to mass-produce production and other issues, to achieve the effects of shortening the research and development cycle, improving the efficiency of promotion and application, and huge economic and social benefits

Active Publication Date: 2017-11-24
于志远
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Among these materials, ceramics have a low yield rate of processed products, silicon carbide is a niche material that is expensive and cannot be mass-produced, and there are few processing equipment

Method used

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Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0068] The preparation process of sapphire microchannel dry etching specifically includes:

[0069] Step 1: using photoresist, Ni or SiO2, etc. to form a mask layer on the surface of the sapphire substrate.

[0070] Step 2: Patterning the mask layer according to the design requirements of the microchannel size to form a mask pattern with the required shape of the microchannel.

[0071] Step 3: Etching the surface of the patterned sapphire substrate by dry method, through the blocking effect of the mask pattern, using chemical gases that can etch sapphire such as chlorine-based gas and physical bombardment such as voltage acceleration, etc., The original microchannel corresponding to the mask pattern is formed on the sapphire surface; wherein, the dry etching can be by using an inductively coupled plasma etching (ICP) system or RIE (reactive ion etching, reactive ion etching) mode .

[0072] Step 4: Pack the prepared final sapphire microchannel into a box by using a conventio...

example 1

[0128] Example 1. Integration of straight channel radiator (reactor) unit:

[0129] Cover plate+I-shape+I-shape+I-shape+.......+I-shape+cover board

example 2

[0130] Example 2. Micromixer (reactor) unit integration:

[0131] Cover plate+I-shape+T-shape+I-shape+T-shape......+I-shape+T-shape+cover board

[0132] Example 3. As a variant of the T-shaped channel, the Y-shape is as integrated as the T-shape.

[0133] The I-shaped microchannel substrate is a linear channel, and the channel can be a straight line or a curve. The channel is processed on one side of the substrate, and the cross-sectional shape of a certain size is concave or semicircular. The surface of the concave or semi-circular channel can be a smooth surface, or a pattern of convex points can be processed to increase the surface area. The I-shaped microchannel substrate can also be processed on both sides, and microchannels are processed on both sides, and the processing method is the same as that on one side.

[0134] T-shaped microchannel single-sided processing: T-shaped microchannel substrate is a linear through channel, the channel is drilled from the A side of th...

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PUM

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Abstract

The embodiment of the invention provides a processing method of a microreactor and the microreactor. The processing method of the microreactor comprises the following steps: processing a sapphire crystal blank into a microreactor substrate; processing a microreaction channel on the surface of the microreactor substrate; forming a microreaction unit by the reactor substrates connected in a laminated manner; and packaging the connecting faces of the microreaction units. A sapphire substrate produced by the processing method of the microreactor provided by the invention is formed to a microreactor production nano material. In the reaction process, the material is reacted in a nanoscale microchannel, the process conditions are controlled well, and the nanomaterial is easily obtained. The product is good in quality, the cost is low and the efficiency is high.

Description

technical field [0001] The invention relates to the technical field of microreactors, in particular to a microreactor processing method and the microreactor. Background technique [0002] At present, the requirements of micro-reaction equipment for substrate materials are mainly colorless, transparent, corrosion-resistant, and high-temperature resistant. For two properties: [0003] 1. Colorless and transparent; because in the process of microchannel design and debugging and packaging of microchemical equipment, the flow, mixing, reaction, and generated morphology of substances must rely on the display of high-speed electron microscopes, which is convenient for observing reactions, and theoretical After the analysis and testing of the reaction products, various technical parameters can be quickly optimized and adjusted, so that the microchemical equipment developed or produced can achieve the design and production goals. [0004] 2. Corrosion resistance and high temperatur...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J19/00
Inventor 于志远何燕清佘建峰刘于航
Owner 于志远
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