Preparation method of concentration tension gradient self-assembled coating
A technology of self-assembly and tension, applied in the field of materials, can solve the problems of low efficiency, long colloidal particle film time, and inability to obtain uniform colloidal particle film, etc., to achieve high production efficiency, facilitate large-area industrial production, and simple operation Effect
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[0026] see figure 1 , the first embodiment of the present invention provides a method for preparing a concentration-tension gradient self-assembled coating, including:
[0027] S1, providing a substrate and a colloidal solution, the colloidal solution comprising a first liquid and colloidal particles dispersed in the first liquid;
[0028] S2, providing a second liquid, the second liquid is miscible with the first liquid, and the surface tension of the second liquid is smaller than the surface tension of the first liquid, and using the second liquid on the surface of the substrate forming a liquid film; and
[0029] S3, bringing the liquid film into contact with the colloidal solution, so as to assemble the colloidal particles on the surface of the substrate to form a self-assembled coating.
[0030] In step S1, the material and type of the substrate are not limited, and can be selected according to actual needs. The surface of the substrate used to form the liquid film may...
Embodiment 1
[0046] The silicon wafer was washed successively with acetone, ethanol, and deionized water for 5 minutes each, and dried with argon gas after cleaning. Put the silicon wafer into absolute ethanol, pull it out of the liquid surface vertically, and the ethanol spreads into a thin film on the surface of the silicon wafer. Dilute the PTFE colloid solution with a mass fraction of 60% with deionized water into a 6% PTFE colloid solution, ultrasonically stir for 10 minutes, and put the substrate vertically into the 6% PTFE colloid solution before the ethanol volatilizes In the process, the liquid surface is pulled vertically at a speed of 3mm / s, and the silicon wafer is placed in the air to dry naturally. After the water evaporates, it is characterized by a scanning electron microscope, as shown in figure 2 As shown, it can be seen that the silicon wafer is covered by the PTFE self-assembled coating, and the PTFE self-assembled coating is monolayer and has good uniformity.
Embodiment 2
[0048] This embodiment is basically the same as the embodiment 1, except that the mass fraction of the PTFE colloid solution is diluted to 12% by deionized water. Characterized by scanning electron microscopy, as image 3 As shown, the silicon wafer is covered by the PTFE self-assembled coating, and the PTFE self-assembled coating is double-layered and has good uniformity.
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