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Synthetic method of aminated mesoporous silicon dioxide for modified cyanate ester resin

A cyanate ester resin and aminated mesoporous technology, which is applied in the field of base materials for high-frequency printed boards, can solve the problems of reducing the mechanical properties and thermal properties of polymers, save materials and energy, have broad market prospects, and a preparation method simple effect

Inactive Publication Date: 2017-12-29
NORTHWESTERN POLYTECHNICAL UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, adding only POSS can reduce ε and significantly improve the toughness of the polymer, but the significant reduction of ε requires the addition of a large amount of POSS, which will reduce the mechanical and thermal properties of the polymer.

Method used

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  • Synthetic method of aminated mesoporous silicon dioxide for modified cyanate ester resin
  • Synthetic method of aminated mesoporous silicon dioxide for modified cyanate ester resin
  • Synthetic method of aminated mesoporous silicon dioxide for modified cyanate ester resin

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0052] The synthetic method of the aminated mesoporous silica for modified cyanate resin of the present embodiment comprises the steps:

[0053] Step 1: Roasting (flow chart as figure 1 shown)

[0054] Step (1.1): Dissolve the template agent D2000 in ethanol, add deionized water, and stir at a constant temperature of 25°C for 1 hour, then add TEOS, and continue to stir with a magnetic stirrer for 30 minutes after mixing. The TEOS, template agent D2000 , The molar ratio of deionized water and ethanol is 1.0:0.125:220:17, then shake and stir in a constant temperature hot water bath at 25°C for 20h, cool to room temperature at 25°C, pass through a 60-mesh sieve, wash with water, and use electric heating to blow Dried in a drying oven at 70°C and crushed to 1 μm to obtain MPS, which was evenly divided into two equal parts;

[0055] Step (1.2): Calcining an aliquot of MPS obtained in step (1.1) in a muffle furnace for 5 hours to obtain calcined C-MPS;

[0056] Step (1.3): Mix th...

Embodiment 2

[0065] The synthetic method of the aminated mesoporous silica for modified cyanate resin of the present embodiment comprises the steps:

[0066] Step 1: Roasting (flow chart as figure 1 shown)

[0067] Step (1.1): Dissolve the template agent D2000 in ethanol, add deionized water, and stir at a constant temperature of 20°C for 30 minutes, then add TEOS, and continue stirring with a magnetic stirrer for 40 minutes after mixing. The TEOS, template agent D2000 , The molar ratio of deionized water and ethanol is 0.6:0.08:170:15, then shake and stir in a constant temperature hot water bath at 45°C for 17h, cool to room temperature at 28°C, pass through a 70-mesh sieve, wash with water, and use electric heating to blow Dried in a drying oven at 85°C and crushed to 5mm to obtain MPS, which was evenly divided into two equal parts;

[0068] Step (1.2): Calcining an aliquot of MPS obtained in step (1.1) in a muffle furnace for 4 hours to obtain calcined C-MPS;

[0069] Step (1.3): Mix...

Embodiment 3

[0078] The synthetic method of the aminated mesoporous silica for modified cyanate resin of the present embodiment comprises the steps:

[0079] Step 1: Roasting (flow chart as figure 1 shown)

[0080]Step (1.1): Dissolve the template agent D2000 in ethanol, add deionized water, and stir at a constant temperature at 40°C for 2 hours, then add TEOS, and continue to stir with a magnetic stirrer for 1 hour after mixing. The TEOS, template agent D2000 , The molar ratio of deionized water and ethanol is 1.5:0.13:240:20, then shake and stir in a constant temperature hot water bath at 65°C for 25 hours, cool to room temperature at 30°C, pass through a 80-mesh sieve, wash with water, and use electric heating to blow Dried in a drying oven at 100°C and crushed to 10mm to obtain MPS, which was evenly divided into two equal parts;

[0081] Step (1.2): Calcining an aliquot of MPS obtained in step (1.1) in a muffle furnace for 6 hours to obtain calcined C-MPS;

[0082] Step (1.3): Mix t...

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Abstract

The invention discloses a synthetic method of aminated mesoporous silicon dioxide for modified cyanate ester resin and belongs to the technical field of a basis material for a high frequency printing board. The method comprises the following steps: roasting; extracting; and preparing a POSS-MPS / CE composite material. The mesoporous silicon dioxide is synthesized by means of an extraction method. The aminated mesoporous silicon dioxide which is intact in mesoporous structure and relatively great in pore diameter is obtained by means of a method of grafting amino first and then dissolving a template agent. The template agent plays roles of protecting and supporting the porous structure in the whole process.

Description

technical field [0001] The invention relates to a method for synthesizing aminated mesoporous silica for modifying cyanate resin, and belongs to the technical field of matrix materials for high-frequency printed boards. Background technique [0002] With the rapid development of high-frequency printed circuit boards and wave-transparent materials, polymers are required to have more excellent dielectric, mechanical and thermal properties. The physical and chemical properties of cyanate ester resin (abbreviated as CE) are particularly excellent, and the dielectric coefficient (ε) is usually low, generally in the range of 2.8-3.2. In addition, cyanate resin also has the characteristics of good heat resistance, shrinkage rate and low moisture absorption rate, which determine its wide application in aerospace load-bearing structural parts, high-performance electronic printed circuit boards, stealth materials, etc. potential. However, the reaction and curing temperature of CE re...

Claims

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Application Information

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IPC IPC(8): C08K9/04C08K9/06C08K7/26C08L79/04
CPCC08K9/04C08K7/26C08K9/06C08K2201/014C08L79/04
Inventor 焦剑武祯祯亓璐邵雨滴
Owner NORTHWESTERN POLYTECHNICAL UNIV
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