Laser annealing apparatus and method
A laser annealing and laser technology, which is applied in the manufacture of electrical components, circuits, semiconductors/solid-state devices, etc., can solve the problems of low degree of control freedom, inability to take measures to eliminate pattern effects, poor process adaptability, etc.
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[0063] The following will combine Figure 1 to Figure 6 The annealing device for improving annealing uniformity based on reflectivity distribution provided by the present invention is described in detail, which is an optional embodiment of the present invention. It can be considered that those skilled in the art can, within the scope of not changing the spirit and content of the present invention, Revise and polish it.
[0064] The present invention provides an annealing device for improving annealing uniformity based on reflectivity distribution, including a host 000, a laser light source subsystem 100, an optical subsystem 200, a spatial light intensity modulation subsystem 300, and a temperature monitoring subsystem 400, wherein:
[0065] The temperature monitoring subsystem 400 monitors the temperature at the laser irradiation position on the surface of the silicon wafer and feeds it back to the host; in other words, it monitors the temperature of the laser irradiation are...
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