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System and method for imaging a sample with an illumination source modified by a spatial selective wavelength filter

A technology of spatial filter and lighting source, which can be applied in the direction of photographic plate-making process, instruments, scientific instruments, etc. on the patterned surface, and can solve the problems of light pollution, component damage, etc.

Inactive Publication Date: 2018-01-26
KLA TENCOR CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This thermal loading can eventually cause component damage or photo-contamination in the system, therefore, there is a need to eliminate the above-identified deficiencies in the prior art

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  • System and method for imaging a sample with an illumination source modified by a spatial selective wavelength filter
  • System and method for imaging a sample with an illumination source modified by a spatial selective wavelength filter
  • System and method for imaging a sample with an illumination source modified by a spatial selective wavelength filter

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Embodiment Construction

[0017] Reference will now be made in detail to the disclosed subject matter illustrated in the accompanying drawings.

[0018] While particular embodiments of the invention have been described, it should be apparent that various modifications and embodiments of the invention can be made by those skilled in the art without departing from the scope and spirit of the foregoing disclosure. Accordingly, the scope of the present invention should be limited only by the claims appended hereto.

[0019] generally refer to Figures 1A to 1F , according to the present invention, a system and method for filtering spectral radiation of an illumination source are described. Embodiments of the invention involve selecting a set of desired wavelengths from the spectrum of an illumination source. Additional embodiments relate to coupling spectrally filtered wavelengths with illumination optics of corresponding imaging systems (eg, wafer inspection subsystems, metrology subsystems, and the lik...

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Abstract

A system for illuminating a sample with a spectrally filtered illumination source includes an illumination source configured to generate a beam of illumination having a first set of wavelengths. In addition, the system includes a wavelength filtering sub-system, a sample stage, an illumination sub-system, a detector, and an objective to focus illumination from the surface of one or more samples and focus the collected illumination to the detector. Further, the wavelength filtering sub-system includes one or more first dispersive elements positioned to introduce spatial dispersion into the beam, a spatial filter element, and one or more dispersive elements positioned to remove spatial dispersion from the beam. The spatial filter element is further positioned to pass at least a portion of the beam including a second set of wavelengths, wherein the second set of wavelengths is a subset of the first set of wavelengths.

Description

technical field [0001] The present invention relates generally to wafer inspection systems, and in particular to illuminating wafers with spectrally filtered illumination sources. Background technique [0002] The smallest feature size resolvable by an optical system designed for inspection or manufacturing is inversely proportional to the wavelength of the illumination source. There is therefore a continuing need to develop sources with shorter wavelengths and higher intensities at these wavelengths. However, the development of increasingly powerful sources of illumination has brought new challenges to the development of systems and methods for harnessing this illumination. A significant challenge associated with designing optical systems effective for wavelengths spanning into the ultraviolet is that many materials are highly absorbing of short wavelength illumination. This high absorption not only leads to a reduction in performance, but can also become a factor limitin...

Claims

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Application Information

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IPC IPC(8): G01N21/88G01N21/95G03F7/20
CPCG01N21/01G01N21/8806G01N21/9501G02B26/0833G02B5/203H05G2/003H05G2/008G01N2021/8845G01N2021/0112G03F7/7065
Inventor 赵伟K·P·格罗斯I·贝泽尔M·潘泽尔
Owner KLA TENCOR CORP