Plasma spectroscopic analysis method and plasma spectroscopic analyzer

A plasma and analysis method technology, applied in the field of plasma spectroscopic analysis and plasma spectroscopic analysis device, can solve the problems of foreign matter mixed in, analysis result changes, low analysis sensitivity, etc., and achieve the effect of suppressing analysis error and high analysis sensitivity
CN107643279AInactive Publication Date: 2018-01-30ARKRAY INC
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
ARKRAY INC
Publication Date
2018-01-30
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention provides a plasma spectroscopic analysis method and a plasma spectroscopic analyzer, the analytical sensitivity is high, and for example, occurrence of analytical errors in sample analysis is suppressed. A plasma spectroscopic analysis method includes a concentration process including a voltage application period in which voltage is applied to a pair of electrodes in the presence ofa sample thereby concentrating an analyte contained in the sample in the vicinity of at least one of the pair of electrodes; and a detection process of generating a plasma by applying voltage to the pair of electrodes and detecting light emitted by the analyte due to the plasma. An electric current between the pair of electrodes is constant while applying voltage for at least a part of the duration of the concentration process.
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Description

technical field

[0001] The present disclosure relates to a plasma spectroscopic analysis method and a plasma spectroscopic analysis device. Background technique

[0002] As a method of analyzing an analyte in a sample, an analysis method using plasma luminescence is known. Regarding the analysis method, Patent Document 1 discloses a method of analyzing a sample using a high-frequency plasma mass spectrometer. Furthermore, Patent Documents 2 and 3 disclose a method of analyzing a sample by generating plasma in a sample by using a plasma generator having a narrow portion, and analyzing plasma luminescence. In addition, Patent Documents 4 and 5 disclose methods of generating plasma in a liquid sample and analyzing the sample by analyzing plasma luminescence.

[0003] However, in the method of Patent Document 1, if an appropriate pretreatment is not performed, there is a problem that the analysis result changes due to the contamination of other substances. Furthermore, in the...

Claims

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