A preparation method of organosilicon nano protective coating with modulated structure

A technology of protective coating and nano-coating, applied in coating, metal material coating process, gaseous chemical plating, etc., can solve the problems of performance degradation such as heat dissipation and signal transmission, single performance, etc., to reduce stress, The effect of improving toughness

Active Publication Date: 2018-12-18
JIANGSU FAVORED NANOTECHNOLOGY CO LTD
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0016] At present, for single-structure or single-component coatings, the performance is relatively single. To improve its protective performance, the thickness must be increased, and increasing the thickness will lead to performance degradation such as heat dissipation and signal transmission.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A preparation method of organosilicon nano protective coating with modulated structure
  • A preparation method of organosilicon nano protective coating with modulated structure
  • A preparation method of organosilicon nano protective coating with modulated structure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0084] A preparation method of an organosilicon nano protective coating with a modulated structure, comprising the following steps:

[0085] (1) Pre-processing:

[0086] Place the substrate in the reaction chamber of the nano-coating preparation equipment, close the reaction chamber and continuously evacuate the reaction chamber, pump the vacuum in the reaction chamber to 10 mTorr, pass in the inert gas Ar, and open the movement mechanism , causing the substrate to move in the reaction chamber;

[0087] In step (1), the base material is a solid material, and the solid material is a block aluminum material and a PCB board, and any interface of the base material surface can be exposed to cold and heat after the cold and heat cycle impact coating is prepared. in a loop test environment.

[0088] In the step (1), the reaction chamber is a rotating chamber, the volume of the reaction chamber is 50 L, the temperature of the reaction chamber is controlled at 30° C., and the flow ra...

Embodiment 2

[0110] A preparation method of an organosilicon nano protective coating with a modulated structure, comprising the following steps:

[0111] (1) Pretreatment

[0112] Place the substrate in the reaction chamber of the nano-coating preparation equipment, close the reaction chamber and continuously evacuate the reaction chamber, evacuate the vacuum in the reaction chamber to 60 millitorr, feed inert gas He, start the movement mechanism, move the substrate;

[0113] In step (1), the base material is a solid material, and the solid material is a block aluminum material, and any interface of the base material can be exposed to a damp heat test environment after the wet heat-resistant alternating coating is prepared on the surface of the base material.

[0114] The volume of the reaction chamber in step (1) is 280 L, the temperature of the reaction chamber is controlled at 40° C., and the flow rate of the inert gas is 15 sccm.

[0115] In step (1), the base material performs plane...

Embodiment 3

[0136] A preparation method of an organosilicon nano protective coating with a modulated structure, comprising the following steps:

[0137] (1) Pretreatment

[0138]Place the substrate in the reaction chamber of the nano-coating preparation equipment, close the reaction chamber and continuously evacuate the reaction chamber, evacuate the vacuum in the reaction chamber to 120 millitorr, pass in the inert gas Ar, start the movement mechanism, move the substrate;

[0139] In step (1), the base material is a solid material, and the solid material is a block polytetrafluoroethylene plate and an electrical component, and any interface of the block polytetrafluoroethylene plate can be exposed after the anti-mold coating is prepared on the surface Used in the GJB150.10A-2009 mold test environment, any interface of the electrical components can be exposed to the environment described in the international industrial waterproof grade standard IPX7 after the waterproof and electric brea...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
poweraaaaaaaaaa
hardnessaaaaaaaaaa
Login to view more

Abstract

A preparation method for an organosilicon nano-protective coating having a modulation structure, belonging to the field of plasma technology. In the method, the vacuum degree within a reaction chamber is adjusted, an inert gas is introduced, a base material is caused to move, and organosilicon coating preparation and organic fluorocarbon coating preparation are performed alternately to form an organosilicon-fluorocarbon modulation multi-layer compact structure. An organosilicon monomer vapour component is a mixture of at least one organosilicon monomer containing a double bond, Si-Cl, Si-O-C, Si-N-Si or Si-O-Si structure or an annular structure and at least one polyfunctional unsaturated hydrocarbon or hydrocarbon derivative. The formed organosilicon-fluorocarbon modulation multi-layer compact structure reduces coating stress and increases coating toughness. Lateral interfaces are present between the organosilicon and the fluorocarbon, corrosive media encounter the lateral interfaces during corrosion of the coating, and corrosion develops laterally, so that longitudinal corrosion which penetrates the coating is not prone to forming, thereby preventing the corrosive media from passing through the coating and corroding protected materials and devices.

Description

technical field [0001] The invention belongs to the technical field of plasma chemical vapor deposition, and in particular relates to a preparation method of an organosilicon nano protective coating. Background technique [0002] Anti-mold, anti-humidity, and anti-salt mist (referred to as three antis) are important problems that need to be solved during the storage, transportation and use of electronic devices. Mold, salt spray and humidity often cause electronic devices to fail due to short circuits. [0003] At present, the use of protective coatings to protect electronic products is an effective way to improve the service life of electronic products. There are generally two methods for obtaining protective coatings, liquid phase and gas phase. The liquid phase method usually uses conformal paint. After coating the electronic products, it is cured by heat or light to form a dense organic coating on the circuit board to protect the circuit board and its related equipment...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/517C23C16/56
CPCC23C16/517C23C16/56
Inventor 宗坚
Owner JIANGSU FAVORED NANOTECHNOLOGY CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap