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Metal plate film plating method and device

A metal plate, metal substrate technology, applied in metal material coating process, sputtering plating, ion implantation plating, etc., to achieve the effect of wide application range, fine ion plating and high quality

Inactive Publication Date: 2018-02-23
汪会平
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, the successful precedent of stainless steel molded plate made of stainless steel, especially 304 material, vacuum-plated with a hard film layer of 2-8 microns without deformation, has not been reported before.

Method used

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  • Metal plate film plating method and device
  • Metal plate film plating method and device
  • Metal plate film plating method and device

Examples

Experimental program
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Effect test

Embodiment

[0049] Embodiment: Plating stainless steel plate 30 substrate, typically adopting 304 grade, thickness 1.5-8mm, commonly used is about 4-6mm, area is more than 2 square meters, the stainless steel plate substrate is first coated with a layer of titanium and chromium in the vacuum coating chamber , and then plated with 2 to 10 cycles of hard film coating of titanium 31 and carbide alloy 32 or titanium 31 and boride alloy 32, the total thickness is 2-8 microns, generally 5-6 microns, carbide alloy Or the boride alloy is sandwiched in the middle of the titanium transition layer, and the hard film coating has both hardness and toughness. The distribution of the target material will be different when there are two warehouses with the same capacity.

[0050] Hard film coating including titanium and chromium (nickel) and carbide alloy or titanium and boride alloy, the total thickness is 2-8 microns, carbide alloy or boride alloy is sandwiched between titanium transition layer, hard f...

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PUM

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Abstract

A metal plate film plating method is characterized by being implemented in arranged devices such as material libraries, an ion plating chamber and a third vacuum chamber; 2-20 metal baseplates are arranged in a first vacuum chamber to serve as the material libraries; a track-variable metal baseplate circulating transmission system is arranged between the material libraries and the interconnected ion plating chamber as well as between the material libraries and the third vacuum chamber; the film plating operation is performed on the track-variable metal baseplate circulating transmission systemthrough a second vacuum film plating chamber, namely the ion plating chamber; titanium is adopted as a target material in the ion plating chamber; a hard film plating layer is made of a carbide alloyor a boride alloy; a metal baseplate is circulated on variable tracks in the material libraries, the interconnected ion plating chamber and the third vacuum chamber for several times, and subjected to the continuous circulating film plating operation on first and second transverse tracks of the ion plating chamber for several times; the circulation of the metal baseplate is supported and driven by a plurality of V-shaped wheels and a plurality of groups of clamping wheels of an upper track; the baseplate is directly supported by V-shaped grooves of the V-shaped wheels; the V-shaped wheels comprise driving wheels and driven wheels; and the baseplate is driven in such a manner that the V-shaped wheels rotate rather than rolling.

Description

technical field [0001] The invention relates to a metal plate coating method, in particular to a metal plate ion vacuum coating method and device. Background technique [0002] CN 102352481 is a method and device for ion vacuum coating on metal plates proposed by the inventor --------- using a magnetron columnar arc source multi-arc ion coating (physical plating or ion plating), the device is in A magnetron columnar arc source (tubular metal target) is installed in the center of the coating chamber. It consists of a vacuum coating chamber, a workpiece turret, a magnetron columnar arc source, an air intake (different working gases need to be introduced after vacuuming when plating different materials) system, a magnetron columnar arc source power supply, a workpiece heating source, and an arc ignition system. , Vacuum system, workpiece bias power supply. The column arc source is made of tubular metal material as the target material, and several bar-shaped permanent magnets ...

Claims

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Application Information

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IPC IPC(8): C23C14/56C23C14/32
CPCC23C14/568C23C14/325
Inventor 汪会平
Owner 汪会平
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