Shaped Heater and Thermal Field Structure of Single Crystal Pulling Furnace
A heater and pulling furnace technology, applied in the direction of single crystal growth, single crystal growth, self-melting liquid pulling method, etc., can solve the problems of waste of graphite material and difficulty in precise control of the control system, so as to reduce the loss and reduce the The effect of the control system
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Embodiment 1
[0047] see figure 2 , the present invention provides a special-shaped heater 20, the special-shaped heater 20 is suitable for heating the crucible in the thermal field structure of a single crystal pulling furnace, the special-shaped heater 20 includes a heater main body 201, and the heater The main body 201 includes a first part and a second part located below the first part and connected to the first part; the thickness of the first part 2011 of the heater main body gradually increases from top to bottom.
[0048] As an example, the shaped heater 20 may be, but not limited to, a graphite heater.
[0049] As an example, the first part 2011 of the heater body and the second part 2012 of the heater body are integrally formed, that is, the first part 2011 of the heater body and the second part 2012 of the heater body are integrally formed.
[0050] As an example, the junction of the heater body first portion 2011 and the heater body second portion 2012 is close to the bottom o...
Embodiment 2
[0060] see image 3 , the present invention also provides a single crystal pulling furnace thermal field structure, the single crystal silicon pulling furnace thermal field structure includes: a furnace body 21; a crucible 22, the crucible 22 is located in the furnace body 21; as implemented For the special-shaped heater 20 described in Example 1, the special-shaped heater 20 is located inside the furnace body 21 and on the periphery of the crucible 22 . For the specific structure of the special-shaped heater 20 , please refer to Embodiment 1, which will not be repeated here.
[0061] As an example, the crucible 22 includes a graphite crucible 221 and a quartz crucible 222 , and the quartz crucible 222 is located in the graphite crucible 221 .
[0062] As an example, the thermal field structure of the single crystal silicon pulling furnace further includes: a heat shield 23, the heat shield 23 is located in the furnace body 21 and above the crucible 22; a graphite structure 2...
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