Hybrid plasma generator for processing silicon-based material

Abstract

A hybrid plasma generator for processing silicon-based materials, mainly composed of a DC plasma generator and a radio-frequency inductively coupled plasma generator, and a common RF-coupled plasma generator for processing silicon-based materials In comparison, this hybrid plasma generator has the following outstanding advantages: 1. High processing efficiency, under the action of the magnetic field of the induction coil, the arc plasma jet is excited twice, and more energy is obtained per unit time to excite the working gas, so that the unit volume The number of reactive particles in the middle increases; 2. Optimizing the ignition process, relying on the electric spark generated by the cathode part and the anode part to complete the ignition, overcoming the problem that the traditional radio frequency inductively coupled plasma generator is easy to damage the quartz glass tube during the ignition process; 3. After upgrading The surface quality of silicon-based materials, the plasma jet that maintains a constant beam spot diameter for a long time under the condition of constant setting parameters, realizes the deterministic processing of the material surface.

Description

technical field [0001] The invention discloses a hybrid plasma generator used for processing silicon-based materials, which belongs to the field of plasma processing equipment. Background technique [0002] In recent years, silicon-based ultra-precision parts have become more and more widely used in aerospace, astronomical observation and other fields, and the demand is increasing. Requirements such as degenerated layers and subsurface damage. In order to achieve the above goals, plasma excitation such as CF 4 A kind of trajectory surface processing method dominated by active reactive particles generated by working gas has received great attention from researchers at home and abroad. [0003] At present, the way to excite the working gas to generate active reactive particles mainly relies on radio frequency inductively coupled plasma generators. This method can excite the working gas to generate active reactive particles, and rely on the chemical reaction between the acti...

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Problems solved by technology

This method can excite the working gas to generate active reactive particles, and rely on the chemical reaction between the active reactive particles and the silicon-based material to generate gas phase products, which can avoid surface deterioration and subsurface damage on the processed surface, but in the induction coil area, The Lorentz force will induce a strong swirling eddy current, resulting in unstable shape of the plasma jet at the jet port of the device during the processing, unable to obtain a constant beam spot diameter, and the quality of the processed surface cannot reach the ideal goal; and there are The skin effect of the current, the high temperature area deviates from the axis of the quartz glass tube, and the energy is not fully coupled into the plasma jet, resulting in low processing efficiency

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