The invention relates to an enhanced 
radio frequency inductively coupled plasma discharge device and belongs to the low-temperature 
plasma application technical field. According to an existing ICP 
discharge device, the density of plasmas is difficult to achieve a high numerical value due to weak collision, while, with the enhanced 
radio frequency inductively coupled plasma discharge device of the invention adopted, the above situation can be avoided. The enhanced 
radio frequency inductively coupled plasma discharge device comprises an upper end cover, a lower end cover, a cylinder 
quartz glass tube, a plurality of long rod bolts, an inner 
electrode coil and an outer 
electrode coil; the upper end cover, the lower end cover and the cylinder 
quartz glass tube jointly form a vacuum cavity 
air chamber; a plurality of upper end mounting holes are uniformly distributed at the outer edge portion of the upper end cover along the circumferential direction of the upper end cover; an inner 
electrode coil mounting hole and an air inlet are formed in the upper end cover; a plurality of lower end mounting holes are uniformly distributed at the outer edge portion of the lower end cover along the circumferential direction of the lower end cover; a measurement hole and a vacuumizing hole are formed in the lower end cover, wherein the measurement hole is used for accommodating a probe-class measuring component, and the vacuumizing hole is connected with a vacuumizing 
system through a vacuum corrugated 
pipe; the outer circumferential surface of the cylinder 
quartz glass tube is provided with the outer electrode coil; and the inner electrode coil is arranged in the vacuum cavity 
air chamber and is installed in the inner electrode coil mounting hole.