Electrochemical high-throughput testing method and device based on photolithography mask and micro-liquid cell
A photolithography mask and testing device technology, applied in measurement devices, sample preparation for testing, scientific instruments, etc., can solve problems such as high ohmic resistance, oxygen diffusion, liquid leakage, etc., to eliminate crevice corrosion and increase reaction area ratio, the effect of precise control of the reaction area
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[0046] Utilizing photolithographic mask technology to perform array photolithographic mask pinholes on the surface of metal samples is a relatively mature commercial standardized operation, which will not be described in the present invention. In this embodiment, a method based on photolithographic mask and microscopic The electrochemical high-throughput test device of the liquid pool (see the appendix Figure 1-3 ), using photolithographic mask technology combined with the device described in this embodiment, so that only the microtube 15 can be replaced to carry out the electrochemical test of the multi-size exposed area of the metal sample 22. Photoresist 13 is evenly coated on the surface of the metal sample 22 by photolithographic mask technology, and the photolithographic mask small holes 21 are arrayed. The size of the photolithographic mask small holes can be selected according to needs, even the same metal sample The surface array has photolithographic mask holes of...
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