Electrochemical high-flux testing method based on photolithographic mask and micro liquid tank and device
A photolithographic mask and testing device technology, which is applied in the direction of measuring devices, test sample preparation, scientific instruments, etc., can solve problems such as liquid leakage, oxygen diffusion, high ohmic resistance, etc., achieve precise control of reaction area, improve reaction Area ratio, effect of eliminating crevice corrosion
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[0046] Utilizing photolithographic mask technology to perform array photolithographic mask pinholes on the surface of metal samples is a relatively mature commercial standardized operation, which will not be described in the present invention. In this embodiment, a method based on photolithographic mask and microscopic The electrochemical high-throughput test device of the liquid pool (see the appendix Figure 1-3 ), using photolithographic mask technology combined with the device described in this embodiment, so that only the microtube 15 can be replaced to carry out the electrochemical test of the multi-size exposed area of the metal sample 22. Photoresist 13 is evenly coated on the surface of the metal sample 22 by photolithographic mask technology, and the photolithographic mask small holes 21 are arrayed. The size of the photolithographic mask small holes can be selected according to needs, even the same metal sample The surface array has photolithographic mask holes of...
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