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Electrochemical high-flux testing method based on photolithographic mask and micro liquid tank and device

A photolithographic mask and testing device technology, which is applied in the direction of measuring devices, test sample preparation, scientific instruments, etc., can solve problems such as liquid leakage, oxygen diffusion, high ohmic resistance, etc., achieve precise control of reaction area, improve reaction Area ratio, effect of eliminating crevice corrosion

Active Publication Date: 2018-04-20
UNIV OF SCI & TECH BEIJING
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0009] In view of the above-mentioned technical problems, the present invention provides an electrochemical high-throughput testing method and device based on a photolithographic mask and a microfluidic cell, so as to overcome the existing methods and devices in the prior art such as liquid leakage, oxygen diffusion, Problems and defects such as high ohmic resistance ensure the scientificity and rigor of the metal micro-area electrochemical measurement process, and improve the efficiency of metal sample micro-area electrochemical measurement

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  • Electrochemical high-flux testing method based on photolithographic mask and micro liquid tank and device
  • Electrochemical high-flux testing method based on photolithographic mask and micro liquid tank and device
  • Electrochemical high-flux testing method based on photolithographic mask and micro liquid tank and device

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Embodiment 1

[0046] Utilizing photolithographic mask technology to perform array photolithographic mask pinholes on the surface of metal samples is a relatively mature commercial standardized operation, which will not be described in the present invention. In this embodiment, a method based on photolithographic mask and microscopic The electrochemical high-throughput test device of the liquid pool (see the appendix Figure 1-3 ), using photolithographic mask technology combined with the device described in this embodiment, so that only the microtube 15 can be replaced to carry out the electrochemical test of the multi-size exposed area of ​​the metal sample 22. Photoresist 13 is evenly coated on the surface of the metal sample 22 by photolithographic mask technology, and the photolithographic mask small holes 21 are arrayed. The size of the photolithographic mask small holes can be selected according to needs, even the same metal sample The surface array has photolithographic mask holes of...

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Abstract

The invention discloses an electrochemical high-flux testing method based on a photolithographic mask and a micro liquid tank and a device and relates to the technical field of metal corrosion, microcell electrochemistry and systematic data accumulation application. The device comprises a micro liquid tank testing system, a testing liquid updating system, a high-precision XYZ three-dimensional moving platform, a microscopic monitoring system, an electrochemical testing system, a storage and control system and a connection system, wherein the connection system is used for controlling instructions and testing data to be effectively transmitted among the systems. Due to modular design, the device is high in expandability; with the combination of a photolithographic mask technique and the micro liquid tank testing system, and a high-flux idea, the reaction area of a working electrode is precisely controlled, a high solution amount / working electrode reaction area ratio is achieved, influence of reaction products is reduced, seam corrosion is eliminated, risks of liquid leakage, blocking and oxygen diffusion are reduced, relatively low solution resistance is achieved, mask graphs and micro-tube sizes can be selected according to demands, high-flux and automatic measurement on microcell electrochemistry are achieved, and the measurement and analysis efficiency are improved.

Description

technical field [0001] The invention relates to the technical fields of metal corrosion, micro-area electrochemistry and systematic data accumulation and application. In particular, it relates to an electrochemical high-throughput testing method and device based on a photolithography mask and a microfluidic pool. Background technique [0002] The composition and distribution of metal materials, microstructure, defects in materials, stress conditions (including internal stress of materials and external stress) and other factors may affect the corrosion behavior of metal materials (corrosion type and corrosion resistance). rate) have an effect. When metals with the same macroscopic composition differ in their microstructure and composition distribution, not only the corrosion rate but even the corrosion mechanism may be different in the same solution. When traditional electrochemical techniques are used to study localized corrosion of metals, the exposed area of ​​the sample...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N17/02G01N17/00G01N1/44
CPCG01N1/44G01N17/006G01N17/02
Inventor 金莹闫松涛赖召贵文磊毕鹏
Owner UNIV OF SCI & TECH BEIJING
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