Method for increasing uniformity of photolithography energy and improving splicing

Abstract

The invention discloses a method for increasing the uniformity of photolithography energy and improving splicing and a potolithographic system suitable for scanning exposure by using an area array spatial light modulator as a graphic generator. The process comprises the following steps: an acquisition module acquires energy data of the scanning exposure process, an operation module analyzes the energy data, a single line energy distribution map is formed, splicing area energy merging is performed, and characteristic parameters in an unit area of the single line energy distribution map after the energy is merged are extracted; according to the characteristic parameters, the number of target opening times of pixel units in the area array spatial light modulator is calculated, and the operation module transfers the number of the target opening times to a data processing system; the data processing system controls opening or closing of each pixel unit of the area array spatial light modulator according to the number of the target opening times. The method can improve the brightness balance effect and improve the splicing effect without changing the scanning speed or affecting the productivity. The method is also suitable for both inclined scanning and vertical scanning, and has wider application range.

Description

technical field [0001] The invention relates to the technical field of direct writing photolithography systems, in particular to a method for improving photolithography energy uniformity and splicing. Background technique [0002] Direct writing lithography equipment, also known as direct image transfer equipment, is an important equipment in the field of semiconductor and printed circuit board (PCB) production that is different from traditional semi-automatic exposure equipment. It uses a pattern generator to replace the mask plate of the traditional lithography machine, so that the graphic data of the computer can be directly exposed to the wafer or PCB board, saving the time of board making and the cost of making the mask plate, and it can be used as a mask plate itself. . At present, the devices of most manufacturers use the spatial light modulator (SLM) as the pattern generator. The SLM includes a digital micromirror device (DMD) and a liquid crystal display (LCD). Th...

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Problems solved by technology

However, the method in this patent improves the uniformity of light at the cost of greatly reducing the refresh rate of the spatial light modulator-the refresh rate of the spatial light modulator is 32K in the case of monochrome images, and the spatial light modulator in grayscale mode The refresh rate of the light modulator is only 1.9K, which greatly reduces the production capacity; at the same time, this method of gray scale compensation cannot be effectively applied to the exposure system of scanning mode

[0004] In addition, when using SLM as a pattern generator, the stitching problem between scan strips is unavoidable, which will lead to image distortion in the stitched area

In the invention patent with the publication number of patent CN 104536269A in my country, a method of splicing and improving using the SLM triangular area is proposed, but this processing method can only be applied to oblique scanning, and cannot be applied to vertical scanning; this method is very important for improving Light uniformity within the exposure field also has no effect

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