A broadband anti-reflection hydrophobic film and its preparation method
The technology of a hydrophobic film and an antireflection film is applied in the field of broadband antireflection hydrophobic film and its preparation, which can solve the problems that the transmittance of the film layer does not meet the photovoltaic module, cannot be found, and there is no hydrophobic antireflection film, etc., and the preparation cost can be achieved. Low cost, little difference in film thickness, and the effect of improving photoelectric conversion efficiency
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Embodiment 1
[0026] Ordinary architectural glass coating:
[0027] Preparation of silica sol (anti-reflection solution): Inorganic SiO 2 Precursor tetraethyl orthosilicate, absolute ethanol, and ammonia water are mixed in a volume ratio of 0.7:30:1.5, and magnetically stirred at 60°C for 12 hours (specific operation: now add ammonia water to absolute ethanol and place it in a constant temperature oil bath In the pot, after the solution is stable, tetraethyl orthosilicate is added dropwise to absolute ethanol containing ammonia) and then aged at room temperature for 3 days, crushed with an ultrasonic cell pulverizer for 10 minutes, and then treated with 0.22 μm partial fluoride Use after membrane filtration.
[0028] Preparation of hydrophobic modification solution for anti-reflection film: Prepare hexadecyltrimethoxysilane, deionized water and absolute ethanol according to the volume ratio of 1:12:87, put it in a 100 ml beaker, and hydrolyze it with constant temperature magnetic stirring ...
Embodiment 2
[0036] Small area FTO glass coating:
[0037] Preparation of silica sol (anti-reflection solution): Inorganic SiO 2 Precursor tetraethyl orthosilicate, absolute ethanol, and ammonia water are mixed in a volume ratio of 0.7:30:1.5, and magnetically stirred at 60°C for 12 hours (specific operation: now add ammonia water to absolute ethanol, and place it in a constant temperature oil bath In the pot, after the solution is stable, tetraethyl orthosilicate is added dropwise to absolute ethanol containing ammonia) and then aged at room temperature for 3 days, crushed with an ultrasonic cell pulverizer for 10 minutes, and then treated with 0.22 μm partial fluoride Use after membrane filtration.
[0038] Preparation of hydrophobic modification solution for anti-reflection film: Prepare hexadecyltrimethoxysilane, deionized water and absolute ethanol according to the volume ratio of 2: 11: 87, put it in a 100 ml beaker, and hydrolyze it with constant temperature magnetic stirring at 35...
Embodiment 3
[0046] Large-area photovoltaic glass coating:
[0047] The present invention can not only coat small glass materials, but also coat large photovoltaic glass according to production and living needs.
[0048] 1. Mix the hydrophobic modification solution and the silica sol solution at a volume ratio of 1:5, stir them, and add them to the medicine box of the coating equipment.
[0049] 2. Put the 1635*985mm photovoltaic glass on the feeding place, start the coating equipment, wash it with disc brush, roller brush, fine washing liquid, rinse and air-dry it, and then transport it to the coating place. The spray speed is 1~5ml / s ( The current spray speed is 5ml / s), and the moving speed is 5~10mm / s (the current moving speed is 8mm / s) to pull the film, and send it into the oven after completion.
[0050] 3. Set the temperature at 100-150°C, the time for 1-4h, and the humidity at 40-70 for drying (at this stage, the coating temperature is set at 110°C and the humidity is 65 for 2 hour...
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