Aluminum-doped zinc oxide film preparation method with wide characteristic scales
An aluminum-doped zinc oxide, characteristic scale technology, applied in the field of photochemistry, can solve the problems of low carrier mobility and high resistivity of AZO films
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[0015] This embodiment specifically includes the following steps
[0016] 1) AZO thin films were grown by magnetron sputtering. Al doped with 2-3% Al 2 O 3 The / ZnO ceramic is the sputtering target, the purity of the target is 99.995%, the diameter is 2 inches, and the ordinary glass is used as the substrate. First, the glass was ultrasonically cleaned with detergent, acetone, and absolute ethanol in sequence, rinsed with deionized water several times after each cleaning, and finally dried with nitrogen before being placed in the sputtering chamber. Before being put into the sputtering chamber, the targets were ultrasonically cleaned with acetone, rinsed with deionized water, soaked in isopropanol solution, and finally dried with nitrogen. The background vacuum of the sputtering chamber is 5×10 -4 Pa, the distance between the target and the glass substrate is 6.0cm, the working pressure is 0.6Pa, the working gas is a mixed gas of argon and hydrogen, and the mass fraction o...
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