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Removal device and removal method of trace methane in krypton-xenon gas mixture

A mixed gas, krypton and xenon technology, applied in chemical instruments and methods, inert gas compounds, inorganic chemistry, etc., can solve the problem of difficult removal of methane, and achieve the effect of simple purification device, excellent removal effect and excellent purification effect.

Pending Publication Date: 2018-10-02
NANJING SPECIAL GAS FACTORY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Purpose of the invention: The present invention provides a device for removing trace methane in krypton-xenon mixed gas, which can solve the problem that methane is difficult to remove in krypton-xenon mixed gas

Method used

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Embodiment 1

[0020] Embodiment 1: as figure 1 As shown, a device for removing trace amounts of methane in a krypton-xenon mixed gas according to the present invention includes a first purification pipe 1, a second purification pipe 2, a pipeline system and a valve system; the first purification pipe 1 is filled with particle diameter It is a 2-3mm 506TJW type demethanization catalyst, the second purification pipe 2 near the air inlet of the second purification pipe is the first adsorption layer 21, and the first adsorption layer 21 is a PEE type high-efficiency deoxygenation adsorbent; the second purification pipe The gas outlet is the second adsorption layer 22, the second adsorption layer is composed of 5A molecular sieve, the volume ratio of the first adsorption layer 21 and the second adsorption layer 22 is 1:1.

[0021] The pipeline system and valve system of this removing device comprise the first connection pipe 31 that is communicated with the first purification pipe inlet, the sec...

Embodiment 2

[0033] Such as figure 2 As shown, a device for removing trace amounts of methane in a krypton-xenon mixed gas according to the present invention includes a first purification pipe 1, a second purification pipe 2, a pipeline system and a valve system; the first purification pipe 1 is filled with particle diameter It is a 2-3mm 506TJW type demethanization catalyst, the second purification pipe 2 near the air inlet of the second purification pipe is the first adsorption layer 21, and the first adsorption layer 21 is a PEE type high-efficiency deoxygenation adsorbent; the second purification pipe The gas outlet is the second adsorption layer 22, the second adsorption layer is composed of 5A molecular sieve, the volume ratio of the first adsorption layer 21 and the second adsorption layer 22 is 1:1.

[0034]The pipeline system and valve system of this removing device comprise the first connection pipe 31 that is communicated with the first purification pipe inlet, the second conne...

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Abstract

The invention discloses a removal device and a removal method of trace methane in a krypton-xenon gas mixture. The removal device comprises a first purification pipe, a second purification pipe, a first connecting pipe, a second connecting pipe and a third connecting pipe, wherein a first valve is arranged on the first connecting pipe; a second valve and a third valve that are connected in seriesare arranged on the second connecting pipe; a first bypass branch pipe communicated with the second connecting pipe is arranged between the second valve and the third valve; a fourth valve is arrangedon the first bypass branch pipe; a fifth valve is arranged on the third connecting pipe; the first purification pipe is filled with a demethanation catalyst; and the second purification pipe is filled with a first adsorption layer comprising a desoxidant and a second adsorption layer comprising a molecular sieve. Trace methane in the krypton-xenon mixed gas can be effectively removed by the device, and the device solves the problems that methane is difficult to remove, and high-purity special gas is difficult to prepare.

Description

technical field [0001] The invention relates to a purification device and a purification method, in particular to a device and method for removing trace methane in krypton-xenon mixed gas. Background technique [0002] Rare gases such as xenon are mainly extracted from liquid oxygen in the air separation method. Since the boiling point of krypton (-153.4°C) is very close to that of methane (-161.5°C), when low-temperature separation of rare gases such as krypton and xenon is used, A slight change in the operation process can easily cause a small amount of methane gas to be introduced into the krypton gas. The quality inspection of krypton gas products is performed by gas chromatography. The chromatographic peaks of krypton gas and methane are very close, and the methane peak is easily covered by the main peak of krypton gas and misjudged. It is easy to cause krypton gas with excessive methane content to leave the factory. There is no special quality control method, and the ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B23/00
CPCC01B23/0094
Inventor 林圣钧陈伟
Owner NANJING SPECIAL GAS FACTORY
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