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Carbon nitride composite photocatalyst, preparation method and application thereof

A technology of composite light and catalyst, applied in the direction of physical/chemical process catalysts, chemical instruments and methods, metal/metal oxide/metal hydroxide catalysts, etc., can solve the problems of low activity of visible light and weak adsorption performance

Active Publication Date: 2018-10-19
ZHEJIANG GONGSHANG UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

BiVO 4 The adsorption performance of the reactants is weak, and the photogenerated carriers are easy to recombine in the catalyst body, so that the new photocatalyst BiVO 4 Visible light activity is not high

Method used

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  • Carbon nitride composite photocatalyst, preparation method and application thereof
  • Carbon nitride composite photocatalyst, preparation method and application thereof
  • Carbon nitride composite photocatalyst, preparation method and application thereof

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preparation example Construction

[0058] BiVO 4 / Ag 3 VO 4 Loaded ultrasonic peeling C 3 N 4 The preparation method of composite photocatalyst comprises the steps:

[0059] (1) Preparation of ultrasonically peeled C 3 N 4 weak:

[0060] 1) Put 5 g of melamine in an agate mortar, grind it vigorously, transfer it to a 50 mL crucible, and place it in a muffle furnace for calcination at 500° C. for 2 hours.

[0061] 2) After taking out the crucible, C was obtained after centrifugation, drying and grinding. 3 N 4 powder.

[0062] 3) Take 0.1gC 3 N 4 The powder is placed in 100mL of 50% ethanol solution, after continuous ultrasonication for six hours, centrifuged at 10000ram / min for 5min, the uniform milky white solution remains, which is the C 3 N 4 weak.

[0063] (2) Preparation of BiVO 4 / Ag 3 VO 4 Loaded ultrasonic peeling C 3 N 4 Composite photocatalyst:

[0064] 1) Add 0.485g Bi(NO 3 ) 3 .5H 2 O powder with 0.170g AgNO 3 Powder placed in 40mL C 3 N 4 The ultrasonic stripping solution ...

Embodiment 1

[0069] Catalysts containing three different components were selected, and the effectiveness of each component was determined by comparing their degradation performance. The catalyst preparation process is as follows:

[0070] (1) BiVO 4 Preparation: Bi(NO 3 ) 3 .5H 2 O powder was ground in a mortar, placed in water, and then sodium vanadate solution was added dropwise. After stirring for 2 hours, BiVO was obtained after centrifugation, drying and grinding. 4 powder.

[0071] (2)Ag 3 VO 4 Preparation: AgNO 3 After the powder is ground in a mortar, it is placed in water, and then sodium vanadate solution is added dropwise. After stirring for 2 hours, Ag is obtained after centrifugation, drying and grinding. 3 VO 4 powder.

[0072] (3) BiVO 4 / Ag 3 VO 4 Preparation: Bi(NO 3 ) 3 .5H 2 O powder and AgNO 3 The powder was stirred in aqueous solution for 1 hour. Add an excess of 0.1mol / L Na dropwise 3 VO 4 solution, after stirring for 2 hours, BiVO was obtained aft...

Embodiment 2

[0074] Explore BiVO 4 / Ag 3 VO 4 The influence of different preparation methods in the catalyst on the performance of the catalyst.

[0075] (1) Mix 0.485g bismuth nitrate + 0.17g silver nitrate, add excess sodium vanadate solution (15mL) dropwise, and stir for 2 hours.

[0076] (2) 0.485g bismuth nitrate + 0.17g silver nitrate were mixed, and excess sodium vanadate solution (15mL) was added dropwise, stirred for 20min, and placed in an autoclave at 140°C for 20 hours.

[0077] (3) Excessive ammonium metavanadate solution + bismuth nitrate were mixed and stirred for 20 minutes, placed in an autoclave at 140°C for 20 hours, and 0.324g BiVO was taken after drying 4 + 0.17g of silver nitrate were mixed, and excess sodium vanadate solution (5ml) was added dropwise, and stirred overnight.

[0078] The three catalysts were centrifugally washed, dried and ground to obtain BiVO prepared by different methods 4 / Ag 3 VO 4 .

[0079] Respectively recorded as BiVO 4 / Ag 3 VO 4 ...

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Abstract

The invention discloses a carbon nitride composite photocatalyst, a preparation method and application thereof. The preparation method comprises: (1) putting C3N4 powder in an ethanol solution for ultrasonic treatment to obtain a milk-white C3N4 stripping liquid; (2) putting Bi(NO3)3.5H2O powder and AgNO3 powder in the C3N4 ultrasonic stripping liquid, and then performing stirring under a shadingenvironment to obtain a mixed solution; and (3) adding a Na3VO4 solution into the mixed solution prepared by step (2) dropwise, conducting stirring, centrifugation, drying and grinding treatment to obtain BiVO4 / Ag3VO4 / C3N4. In the preparation process of BiVO4 / Ag3VO4, C3N4 is introduced synchronously, and on the basis, in order to further broaden the visible light responsiveness, the ultrasonic stripped C3N4 stripping liquid is selected to prepare a BiVO4 / Ag3VO4 / C3N4 ternary heterojunction.

Description

technical field [0001] The invention relates to the technical field of high-efficiency visible light photocatalytic materials, in particular to a BiVO 4 / Ag 3 VO 4 Loaded ultrasonic peeling C 3 N 4 Composite photocatalyst and its preparation method and application. Background technique [0002] In recent years, with the continuous development and progress of science and technology, while people enjoy many conveniences, environmental pollution and energy shortages present a severe development trend, which has also attracted widespread attention from people from all walks of life. In the case of sunlight as the driving force, semiconductor photocatalysts can perform catalytic reactions, such as hydrogen production and organic degradation. However, the existing photocatalysts generally have problems such as weak response to visible light and low photocatalytic efficiency. Therefore, an efficient semiconductor photocatalyst with strong visible light responsivity is very im...

Claims

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Application Information

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IPC IPC(8): B01J27/24C02F1/30C02F1/32C02F101/20
CPCC02F1/30C02F1/32B01J23/002B01J27/24C02F2101/30C02F2101/22C02F2101/20C02F2305/10B01J35/39
Inventor 吴宏王齐高桥远吴圣凯高慧敏傅京炜
Owner ZHEJIANG GONGSHANG UNIVERSITY
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