Method for preparing on-chip electrically-modulated high-quality film micro-optical device
A technology of micro optics and dielectric thin films, applied in chemical instruments and methods, optical components, optics, etc., to achieve the effect of reducing the effective mode volume, reducing the requirements of processing accuracy, and improving efficiency
Inactive Publication Date: 2018-11-23
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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However, traditional chemical mechanical polishing is used to prepare flat material surfaces, rather than to improve the overall quality of on-chip thin film structures.
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[0031] The present invention will be further described below by examples and accompanying drawings, but the protection scope of the present invention should not be limited by this.
[0032] see first figure 1 , figure 1 It is a schematic flow chart of the present invention using femtosecond laser combined with chemical mechanical polishing to prepare on-chip low-loss electro-optic tunable waveguide. Now take the on-chip lithium niobate single crystal thin film as an example to illustrate the method of the present invention. It can be seen from the figure that the present invention utilizes femtosecond laser The method for preparing an on-chip optical whispering gallery mode microcavity combined with chemical mechanical polishing includes the following six steps:
[0033] (1) The surface is plated with Cr metal film: Take an on-chip single crystal lithium niobate thin film sample 7 with a size of 3mm×4mm×1mm, which consists of a substrate 8 with a thickness of about 1mm, SiO ...
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Abstract
A method for preparing an on-chip electrically-modulated high-quality film micro-optical device comprises the steps of plating the surface of a film with a metal layer, selectively ablating a metal film by femtosecond laser, performing chemical mechanical polishing, plating the surface with a dielectric film package, and performing electrode preparation. The on-chip micro-optical device prepared by the method of the present invention has extremely high surface smoothness and extremely low optical loss, and can be electro-optically modulated or electro-thermally modulated by an electrode. The method is suitable for preparing high-quality electrically-modulated micro-optical structures (including but not limited to micro ring cavity, optical waveguide and its coupling devices) on various on-chip films (including but not limited to lithium niobate monocrystal films, quartz films, silicon films, silicon dioxide films, diamond films and the like).
Description
technical field [0001] The present invention relates to femtosecond laser processing and chemical mechanical polishing, in particular to a method for preparing on-chip electrically adjustable microstructures (including microcavity disks, microrings, optical waveguides and their integrated structures) using femtosecond laser processing combined with chemical mechanical polishing . This method is applicable to various on-chip thin film materials, including but not limited to lithium niobate single crystal thin film, quartz thin film, silicon thin film, silicon dioxide thin film, diamond thin film and the like. Background technique [0002] Micro-optical devices refer to micro-structured optical devices with a structure size above the submicron level and a surface roughness up to the nanometer level. On-chip micro-optical devices generally significantly increase the interaction between light and matter by localizing the light field in space and even in time. In basic research ...
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IPC IPC(8): G02B6/26B81B1/00B81C1/00
CPCG02B6/26B81B1/00B81C1/00023
Inventor 程亚伍荣波张健皓乔玲玲林锦添
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI