Gas circulating system for preparing high-quality diamond and application method thereof

A technology of gas circulation and circulation system, which is applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., can solve the problems affecting the quality of diamond film, reduce the production cost, improve the purity of hydrogen, and improve the effect of purity

Active Publication Date: 2018-11-30
UNIV OF SCI & TECH BEIJING
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Problems solved by technology

However, the recycling of gas will inevitably introduce impurities in the deposition system, which will affect the quality of the diamond film, especially the optical quality

Method used

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  • Gas circulating system for preparing high-quality diamond and application method thereof

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Embodiment

[0020] The invention relates to a gas circulation system and a use method for preparing high-quality diamond. The system mainly includes DC jet plasma deposition system, heat exchanger, filter, Roots pump, gas booster pump, oil-water separator, flow meter, hydrogen purifier, ordinary hydrogen, high-purity methane, high-purity argon, etc. .

[0021] Firstly, ordinary hydrogen 6 passes through the flow meter 2 10 to control the flow rate of the hydrogen purifier 12. After being purified by the purifier, the hydrogen in the form of high-purity hydrogen, high-purity methane 15 and high-purity argon 19 is passed into No. 1 DC arc injection Plasma torch 1. After the raw material gas is used for the deposition of the diamond film, the tail gas is pumped out of the No. 1 DC arc jet plasma deposition chamber 2 by the Roots pump 1 5 . Afterwards, the tail gas is cooled down through the heat exchanger one 3, the filter one 4 and the oil-water separator one 8 filter oil gas, water vapor...

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Abstract

The invention relates to a gas circulating system for preparing high-quality diamond and an application method thereof, belonging to the field of material preparation. The gas circulating system comprises direct current jetted plasma chemical vapor deposition systems, a gas supply system, a tail gas circulating system and a gas purification system. The gas supply system supplies feed gas for two direct current jetted plasma chemical vapor deposition systems. The tail gas circulating system can pump out tail gas in the deposition systems and supply the tail gas to the gas purification system composed of a hydrogen purification apparatus. After the tail gas is purified, high-purity hydrogen and a gas mixture containing argon and carbon are separated, wherein the high-purity hydrogen is supplied for deposition devices, and the tail gas containing argon and carbon being used as the feed gas is supplied for one deposition device to deposit heat-sink grade diamond. Another deposition devicecan realize the supply of high-purity gas to deposit an optical-grade diamond film. By the process, the gas circulating system realizes the recycling of the high-purity hydrogen, can meet the preparation demand of a high-quality diamond film, and can also reduce the preparation cost.

Description

Technical field: [0001] The invention relates to a gas circulation system for preparing high-quality diamonds and a method for using the same, in particular to the process of preparing high-quality diamond films by a DC arc plasma jet chemical vapor deposition method, and belongs to the field of material preparation. Background technique: [0002] At present, among many technologies for depositing diamond films, DC arc plasma chemical vapor deposition diamond technology has been widely used due to its fast deposition rate. However, the larger gas consumption leads to higher fabrication costs of the diamond film. [0003] In order to solve this problem, researchers at home and abroad have done a lot of work. Ivan Martorell of Westinghouse Electric and Fanxiu Lu of Beijing University of Science and Technology reported on "Diamond and Related Materials" in 1999 and 2000, respectively, that the use of a gas circulation system to reduce the preparation cost of diamond films. Ho...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/27C23C16/503C23C16/448
CPCC23C16/272C23C16/4412C23C16/448C23C16/503
Inventor 李成明安康陈良贤贾鑫魏俊俊张建军刘金龙
Owner UNIV OF SCI & TECH BEIJING
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