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A preparation method of a photocathode of a streak camera

A stripe camera and photocathode technology, applied in photoemission cathodes, discharge tube main electrodes, X-ray tube electrodes, etc., can solve the problems of undetectable signals, photocathode time resolution reduction, unfavorable high time resolution images, etc. Achieve the effect of wide spectral response range, good transmittance and good time resolution

Active Publication Date: 2018-12-25
LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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Problems solved by technology

However, the photocathode is based on a silicon material, which has a strong absorption of ultraviolet rays and low- and medium-energy X-rays (energy ≤ 5keV), which makes the photocathode unable to detect signals of ultraviolet rays or low- and medium-energy X-rays; at the same time, its micron-sized The microstructure leads to a significant decrease in the time resolution of the photocathode, which is not conducive to obtaining high time-resolved images

Method used

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  • A preparation method of a photocathode of a streak camera
  • A preparation method of a photocathode of a streak camera

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Embodiment 1

[0038] This embodiment introduces a method for preparing a photocathode of a stripe camera whose response range is between ultraviolet rays and X-rays. see figure 1 , the photocathode uses an organic thin film 1 as a supporting structure, and the organic thin film has micropores 4 arranged in an array in the shape of a rounded truncated cone; the top of the organic thin film 1 is a conductive layer 2, and the material of the conductive layer 2 is conductive metal such as Au, Al or Cu. ; Above the conductive layer 2 is the photoemissive layer 3, the photoemissive layer 3 is Au or alkali halogen compound with high photoelectric conversion efficiency, and the alkali halogen compound includes CsI, CsBr, KI or KBr.

[0039] see figure 2 , the preparation process of this embodiment is as follows:

[0040] Provide a piece of polished silicon wafer 5 and a piece of porous anodized aluminum 6 with through holes 7 of uniform pore size, wash the polished silicon wafer 5 and porous ano...

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Abstract

The invention discloses a preparation method of a photocathode of a streak camera. Firstly, a nano-scale columnar microstructure array is fabricated on the surface of a polished silicon wafer by physical vapor deposition and dry etching with porous anodic alumina as a template. Then, microporous organic thin film is prepared by using the columnar microstructure array as a template. The organic thin film was transferred to a photocathode support as the supporting substrate, and a conductive layer and a photoemission layer are deposited on the organic thin film by physical vapor deposition. Finally, the streak camera photocathode with the nano-scale microporous array on the surface is fabricated. The method realizes the fabrication of the photocathode of the streak camera with the nano-scalemicroporous array structure, which can greatly improve the spectral response sensitivity of the photocathode, and has a wide spectral response range, and can carry out the spectral response from ultraviolet light to hard X-ray, and is suitable for the application of the streak camera with high spatial resolution. The method also has the advantages of simple technological process and low cost.

Description

technical field [0001] The invention belongs to the field of photocathode preparation, and in particular relates to a method for preparing a photocathode of a stripe camera. Background technique [0002] A photocathode is a photoelectric conversion device that converts optical signals into electrical signals, and is composed of an organic thin film substrate, a conductive substrate, and a photoemissive layer. The photocathode is the core component of the streak camera, and has important applications in the fields of high energy density physics research, weak signal detection, and low-light imaging. [0003] Existing photocathodes of stripe cameras suitable for ultraviolet and X-ray imaging generally adopt a transmissive planar film structure, and its supporting structure is a planar hydrocarbon substrate film, and a conductive layer and a photoelectric emission layer are deposited on a planar substrate. The structure has the advantages of stable performance, uniform photoel...

Claims

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Application Information

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IPC IPC(8): H01J1/34H01J35/06G01N23/04G03B42/02
CPCG03B42/02H01J1/34H01J35/06G01N23/04
Inventor 黎宇坤陈韬杨志文李晋袁铮邓博邓克立王强强曹柱荣
Owner LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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