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A Method of Improving Surface Resistance to Intense Beam Pulse Thermal Fatigue

A thermal fatigue and pulse technology, applied in the direction of diffraction/refraction/reflection processing, etc., can solve the problems of thermal fatigue effect, surface peeling damage, short service life of components, etc., to reduce thermal stress, reduce temperature gradient, reduce The effect of small heat absorption

Active Publication Date: 2020-03-27
BEIJING UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0002] The fourth-generation X-ray source "X-ray free electron laser" beam (hereinafter referred to as XFEL) has the characteristics of strong full coherence, ultra-high brightness, ultra-short pulse width, ultra-high collimation, and high monochromaticity. The surface of various X-ray optical components is subject to severe thermal fatigue effects, the surface will fail quickly, and the component life is very short
Due to the ultra-high brightness and ultra-short pulse width characteristics of XFEL, the surface of these optical components will suffer from severe thermal fatigue effects, and cracks will rapidly appear on the surface and expand, forming surface peeling damage, eventually causing component failure

Method used

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  • A Method of Improving Surface Resistance to Intense Beam Pulse Thermal Fatigue
  • A Method of Improving Surface Resistance to Intense Beam Pulse Thermal Fatigue
  • A Method of Improving Surface Resistance to Intense Beam Pulse Thermal Fatigue

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Embodiment 1

[0028] Such as Figure 4 As shown, the micro-stripe structure is etched from the silicon surface. First, using the existing "metal catalyzed etching technology" (see the end of this embodiment for details of the specific process steps), etch a strip structure perpendicular to the surface on the surface of n-type low-resistance single crystal silicon, the cross-section of the thin silicon strip is not Regular shape, the cross-sectional dimension is about 300 nanometers, the average gap is about 200 nanometers, and the thin strip length is about 3 microns. The overall strip arrangement structure is composed of mirrors on the end surface, and a negative voltage (-300V) is applied to the surface, which can withstand 1.5J / cm 2 The XFEL beam is irradiated with 1500 pulses, and the surface does not produce thermal fatigue cracks and peeling.

[0029] The specific process steps of the "metal catalytic etching technology" adopted in this embodiment: as in this example, the catalytic ...

Embodiment 2

[0031] Using silicon as the substrate, the functional geometric surface of the grating is first engraved on the silicon surface, and then a cylindrical arrangement structure with a diameter of 5 nanometers, a length of 10 microns and a gap of 1 nanometer is grown on the functional geometric surface of the grating by chemical vapor deposition technology. , nano-carbon cylinders grow perpendicular to the silicon surface, and the cross-sectional shape is circular. The surface of the grating composed of the carbon nanotube arrangement structure, and a negative voltage (-5000V) is applied on the surface, which can withstand 5.0J / cm 2 The XFEL beam is irradiated with 8000 pulses, and the surface does not produce thermal fatigue cracks and peeling.

Embodiment 3

[0033] silicon boride (SiB 3 ) is the surface material of the component, and a strip structure perpendicular to the surface is etched on the surface by photolithography. The cross-section of the thin strip is square, the cross-sectional size is 10 microns, the gap between the thin strips is 5 microns, and the length of the thin strip is 30 microns. The concave mirror composed of the upper surface of the overall strip arrangement structure, no negative voltage is applied to the surface, and can withstand 2.5J / cm 2 The XFEL beam is irradiated with 1000 pulses, and the surface does not produce thermal fatigue cracks and peeling. If a negative voltage of -800V is applied to the surface, it can withstand 3.0J / cm 2 The XFEL beam is irradiated with 1500 pulses, and the surface does not produce thermal fatigue cracks and peeling.

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Abstract

A method for improving surface intense beam pulse thermal fatigue resistance belongs to the high intensity pulse beam source application field. The method is suitable for a component work surface capable of bearing an intense heat pulse load. The component work surface is formed by many micro strip arrangement structures vertical to the surface. A stress state is characterized by a small-scale effect, and a thermal stress is significantly reduced. Most of the secondary electrons generated by an XFEL beam on a surface layer escape to the outer portion of a component surface through strip gaps,and surface thermal absorption is reduced. An average surface layer density is reduced, XFEL penetrates deeper, and a surface temperature gradient is reduced. Therefore, by using the method, the effects of reducing a thermal stress, thermal absorption and a temperature gradient can be achieved, and thermal fatigue damages on the component surface can be greatly decreased.

Description

technical field [0001] The invention belongs to the application field of high-intensity pulsed beam sources, and relates to a method for improving the thermal fatigue resistance of the material surface by constructing a fine strip structure perpendicular to the surface on the surface of the material and using its small-scale effect. Component working surfaces for intense beam pulse thermal loading. Background technique [0002] The fourth-generation X-ray source "X-ray free electron laser" beam (hereinafter referred to as XFEL) has the characteristics of strong full coherence, ultra-high brightness, ultra-short pulse width, ultra-high collimation and high monochromaticity. The surfaces of various X-ray optical components are subject to severe thermal fatigue effects, the surfaces fail quickly, and the life of the components is very short. [0003] When the XFEL beam is applied, it must pass through various X-ray optical elements such as gratings, mirrors, and concave mirror...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G21K1/06
CPCG21K1/06
Inventor 王波薛睿严辉
Owner BEIJING UNIV OF TECH