Manufacture method for lithium niobate electro-optic device thick film traverse electrode

An electro-optical device and manufacturing method technology, applied in the field of optical communication, can solve the problems of large stress of thick film electrodes, waste of precious metals, etc., and achieve the effect of solving a lot of waste and overcoming excessive stress

Active Publication Date: 2019-01-22
XIAN SINO HUAXIN MEASUREMENT & CONTROL
View PDF5 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The invention provides a method for making a thick-film lead electrode of a lithium niobate electro-optic device to overcome the defects of the prior art. Th

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Manufacture method for lithium niobate electro-optic device thick film traverse electrode
  • Manufacture method for lithium niobate electro-optic device thick film traverse electrode
  • Manufacture method for lithium niobate electro-optic device thick film traverse electrode

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0045] Example 1

[0046] A method for manufacturing a thick-film lead electrode of a lithium niobate electro-optical device includes the following steps:

[0047] S1: Coating a metal seed layer on a lithium niobate substrate with a proton exchange waveguide by a coating method to obtain a metalized substrate. The coating method is a plasma deposition method. The metal seed layer is divided into two layers, and the lower layer is adhesion The force-enhancing layer, the adhesion-enhancing layer uses nickel element, the upper layer is a gold layer with a purity of not less than 99.99%, the thickness of the upper layer of the metal seed layer is 35nm, and the thickness of the lower layer of the metal seed layer is 15nm;

[0048] The preparation process of the lithium niobate substrate with proton exchange waveguide is as follows:

[0049] S01: Use silicon dioxide as a barrier layer to fabricate an optical waveguide on the surface of a lithium niobate substrate by annealing proton exchang...

Example Embodiment

[0055] Example 2

[0056] A method for manufacturing a thick-film lead electrode of a lithium niobate electro-optical device includes the following steps:

[0057] S1: Coating a metal seed layer on a lithium niobate substrate with a proton exchange waveguide by a coating method to obtain a metalized substrate. The coating method is a physical vapor deposition method. The metal seed layer is divided into two layers, and the lower layer is adhesion Force enhancement layer, the adhesion enhancement layer is made of chromium, the upper layer is a gold layer with a purity of not less than 99.99%, the thickness of the upper layer of the metal seed layer is 20nm, and the thickness of the lower layer of the metal seed layer is 10nm;

[0058] The preparation process of the lithium niobate substrate with proton exchange waveguide is as follows:

[0059] S01: Use silicon dioxide as a barrier layer to fabricate an optical waveguide on the surface of a lithium niobate substrate by annealing proton...

Example Embodiment

[0065] Example 3

[0066] A method for manufacturing a thick-film lead electrode of a lithium niobate electro-optical device includes the following steps:

[0067] S1: A metal seed layer is plated on a lithium niobate substrate with a proton exchange waveguide by a coating method to obtain a metalized substrate. The coating method is a magnetron sputtering method. The metal seed layer is divided into two layers, and the lower layer is the adhesive Adhesion enhancement layer, the adhesion enhancement layer uses titanium element, the upper layer is a gold layer with a purity of not less than 99.99%, the thickness of the upper layer of the metal seed layer is 50nm, and the thickness of the lower layer of the metal seed layer is 20nm;

[0068] The preparation process of the lithium niobate substrate with proton exchange waveguide is as follows:

[0069] S01: Use silicon dioxide as a barrier layer to fabricate an optical waveguide on the surface of a lithium niobate substrate by annealing ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Login to view more

Abstract

The invention discloses a manufacture method for a lithium niobate electro-optic device thick film traverse electrode. The manufacture method comprises the following steps that: S1: plating a lithiumniobate substrate with proton exchange waveguide with a metal seed layer, and obtaining a metallized substrate, wherein the metal seed layer is divided into two layers, the lower layer is an adhesiveforce enhancement layer, and the upper layer is a gold layer of which the purity is not lower than 99.99%; S2: carrying out photoresist spin coating on the metallized substrate, and carrying out baking, exposure and developing to obtain a photoresist pattern similar to an electrode; S3: dipping the metallized substrate with the photoresist in gold electroplating liquid to be electroplated; S4: using photoresist removal liquid to remove the photoresist, and forming a raised electrode pattern; and S5: firstly, removing the gold layer of the metal seed layer, and then, removing an adhesion layerto finish the preparation of the thick film traverse electrode. By use of the manufacture method, the problem of overlarge thick film electrode stress is overcome, and the problem that a great quantity of noble metal is wasted is also solved.

Description

technical field [0001] The invention belongs to the field of optical communication or optical fiber sensing, and relates to a method for manufacturing an optical passive device, in particular to a method for manufacturing a thick-film wire electrode of a lithium niobate electro-optical device. Background technique [0002] Integrated circuits are divided into three categories: thin film circuits, thick film circuits, and semiconductor circuits. Circuits mean electronic components such as wires, resistors, and dielectrics. Compared with thin-film wires, thick-film wires are more resistant to high current and high power, and have a higher operating frequency, so they are more suitable for making wire electrodes for high-speed electronic devices. Due to the urgent demand for the modulation rate of lithium niobate devices in optical communication networks and optical fiber sensors, the industry is currently trying to use thicker gold wires as traveling wave electrodes for lithiu...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G02F1/03
CPCG02F1/0316
Inventor 杨广张雪荣王健康黄昀昀
Owner XIAN SINO HUAXIN MEASUREMENT & CONTROL
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap