Preparation method of spherical atom gas chamber

An atomic gas chamber and spherical technology, which can be applied to instruments using atomic clocks, steering induction devices, etc., can solve the problems of the inability of quantum devices to be widely used, high atomic polarization efficiency, disadvantages, etc., and can improve the relaxation time of atomic spins. Effect

Inactive Publication Date: 2019-01-29
重庆鲲量科技有限公司
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Problems solved by technology

Cylindrical and square air cells are not conducive to achieving high atomic polarization efficiency and long

Method used

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  • Preparation method of spherical atom gas chamber
  • Preparation method of spherical atom gas chamber
  • Preparation method of spherical atom gas chamber

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Embodiment Construction

[0013] The following will clearly and completely describe the technical solutions in the embodiments of the present application with reference to the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of them. Based on the embodiments in this application, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the scope of protection of this application.

[0014] see figure 1 , figure 1 It is a schematic flow diagram of an embodiment of the method for preparing a spherical atomic gas cell of the present application, such as figure 1 The preparation method of the spherical atomic gas cell provided by the application comprises the following steps:

[0015] S1, providing a silicon-based cylindrical wafer with double-sided polishing.

[0016] Please combine figure 2 , figure 2 It is a schematic d...

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Abstract

The application discloses a spherical atom gas chamber and a preparation method thereof. The preparation method includes: 1) providing double-surface-polished silicon based cylindrical wafer; 2) on afirst polishing surface of the silicon based cylindrical wafer, forming a first column hole; 3) bonding a first glass round-shaped wafer to the first polishing surface of the silicon based cylindricalwafer; 4) heating the silicon based cylindrical wafer so that air in the first column hole expands to shape a spherical glass bubble communicated with the first column hole; 5) on a second polishingsurface of the silicon based cylindrical wafer, forming a second column hole communicated with the first column hole to shape the spherical atom gas chamber. The method can effectively increase atom spinning relaxation time and atom utilization efficiency.

Description

technical field [0001] The present application relates to the field of gas chamber preparation technology, in particular to a spherical atomic gas chamber and a preparation method thereof. Background technique [0002] With the rapid development of quantum optics and atomic physics, quantum technologies such as quantum communication, quantum computing, quantum imaging and quantum sensing technology have been gradually applied to the development of quantum devices, among which the atomic gas chamber as the core device has naturally become a very important research hotspot. [0003] The preparation process of atomic gas chamber mainly includes two parts, gas chamber preparation and gas filling. Among them, as one of the main links, the gas chamber preparation process, in recent years, researchers have developed a variety of preparation techniques, such as glass shell welding, glass fiber sintering, glass / silicon wafer / glass anode bonding, etc., the prepared atomic gas Most o...

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Application Information

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IPC IPC(8): G01C19/58G01C19/60G04F5/14
CPCG01C19/58G01C19/60G04F5/14
Inventor 王增斌张国万
Owner 重庆鲲量科技有限公司
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