Patterning holographic anti-counterfeiting device capable of achieving precise aluminum plating and preparing method thereof
A holographic anti-counterfeiting and patterning technology, which is applied to the printing, printing, and printing process of producing special varieties of printed matter. It can solve the problems of low precision and complicated aluminum washing process, achieve good aesthetics, improve anti-counterfeiting functions, and simplify The effect of the preparation process
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Embodiment example 1
[0043] (1) Using a 15-micron BOPET film as the substrate film, the substrate layer 1 is obtained;
[0044] (2) For example, by anilox roller coating, the water-based emulsified wax is evenly coated on the PET surface, the coating temperature is 80-120°C, and the speed is 60-90m / min, that is, the release layer 2 is formed;
[0045] (3) Continue to coat the acrylic resin coating on the release layer 2, the thickness of the resin layer is 2 microns, the coating temperature is 80-150°C, and the speed is 60-90m / min;
[0046] (4) Preparation of the micro-nano structure template: first, a holographic photolithography machine is used to photolithography to prepare the second-level concave-convex structure, and the metal nickel plate is obtained by electroforming, and the photoresist is coated on the metal nickel plate, and then prepared with the second level. For the mask plate corresponding to the first-level concave-convex structure pattern, the metal nickel plate and the mask plate...
Embodiment example 2
[0053] (1) take the BOPET pre-coat film of 30 microns as base film, one side of this base film is coated with pre-coat, and this pre-coat and UV coating have stronger adhesive force, i.e. base layer 1;
[0054] (2) on the precoated surface of the substrate layer, adopt the anilox roller coating method to coat a layer of 5 micron UV coating on the substrate layer;
[0055] (3) The preparation of micro-nano structure nickel plate adopts holographic lithography direct writing equipment, designs holographic pattern by Photoshop, then carries out photolithography, adopts high-intensity exposure in the first-level concave area, and the first-level convex area ( The second-level concave-convex structure, holographic area) adopts normal holographic light parameters, and obtains a gradient micro-nano structure through developing and cleaning.
[0056] (3) Lay the UV coating with the master plate of metal nickel, and expose it from the UV surface, and copy the micro-nano structure on th...
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