A Novel Sputtering Ion Pump for Anode Barrel Array

Abstract

A new type of sputtering ion pump with an anode cylinder array, which is characterized in that it includes a casing, an air inlet is provided on the top of the casing, magnets are installed on the left and right sides of the casing, and the anode cylinder array is insulated and installed inside the casing. , and there are cathode plates on both sides of the anode cylinder array. The high-voltage electrode is fixedly assembled with the air inlet. Its positive potential is connected to the anode cylinder array, and its zero potential is connected to the two cathode plates respectively. The cathode plate and the anode cylinder array form a A chamber used to extract gas. The anode cylinder array is composed of multiple groups of anode cylinders. The closer the anode cylinder is to the air inlet, the larger the radius, the lower the height, and the larger the gap between the upper and lower surfaces of the anode cylinder and the cathode plate. , the farther the anode cylinder is from the air inlet, the smaller the radius, the higher the height, and the smaller the gap between the upper and lower surfaces of the anode cylinder and the cathode plate; the present invention can greatly improve the air pumping per unit volume in the sputtering ion pump speed, and can maintain a high pumping speed even in ultra-high vacuum environments.

Description

technical field [0001] The invention belongs to the technical field of vacuum acquisition, and in particular relates to a sputtering ion pump of a novel anode cylinder array. Background technique [0002] The sputtering ion pump was named in the 1950s and the corresponding theory was put forward. It maintains pumping through the Penning discharge principle, and then obtains an ultra-high vacuum environment. It is characterized by zero noise, no vibration, no oil pollution in the pump cavity, simple and firm structure, long service life, no need for refrigerant, wide working pressure range, which can be between 1 and 10 -10 Working in the range of Pa, it is a clean vacuum pump. Its working process is divided into two parts. The first is the Penning discharge process. The electrons in the pump chamber collide with the gas molecules under the action of the electromagnetic field to ionize the gas molecules. The second is the gas capture process. The cations produced bombard th...

AI Technical Summary

Problems solved by technology

[0004] The present invention aims at the defect of low pumping speed of existing sputtering ion pumps in an ultra-high vacuum environment, and provides a new type of sputtering ion pump with an array of anode cylinders

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