Transparent electrode laminate and method of fabricating the same
A technology of transparent electrodes and manufacturing methods, applied to conductive layers on insulating carriers, equipment for manufacturing conductive/semiconductive layers, non-metallic conductors, etc., can solve problems such as continuing demand and achieve improved mechanical stability Effect
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[0059] According to an exemplary embodiment, as described above, the first transparent oxide electrode layer 160 can be relatively formed through a low-temperature process using IZO, and thus, damage to the base material layer 105 can be prevented. For example, the first transparent oxide electrode layer 160 can be formed through a low temperature evaporation process in the range of about 20-130°C.
[0060] A second transparent oxide electrode layer 170 can be formed on the first transparent oxide electrode layer 160 . The second transparent oxide electrode layer 170 may be formed to include a substance having relatively improved transmittance and conductivity compared to the first transparent oxide electrode layer 160 .
[0061] In exemplary embodiments, the second transparent oxide electrode layer 170 may be formed through an evaporation process such as a sputtering process in such a manner as to include ITO.
[0062] For example, by using indium oxide (In 2 o 3 ) and tin...
experiment example
[0097] A base material layer made of COP (manufactured by Zeon Corporation, thickness: 40.5 μm) in which an acrylic hard-coat layer of 1.38 μm was formed on the upper surface and the lower surface was prepared. A first refractive index matching layer (with a thickness of 50 nm) and a second refractive index matching layer (with a thickness of 170 nm) were sequentially formed on the substrate layer. The first refractive index matching layer and the second refractive index matching layer each contain an acrylic resin, and the first refractive index matching layer is formed using a resin in which inorganic particles are additionally dispersed.
[0098] On the above-mentioned second refractive index matching layer, IZO was vapor-deposited through a sputtering process to form a first transparent oxide electrode layer with a thickness of 10 nm. Subsequently, ITO was vapor-deposited on the first transparent oxide electrode layer through a sputtering process to form a second transpare...
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