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Spin current magnetization reversal element and magnetic memory

A technology of magnetic memory and components, which is applied in the field of spin current magnetization reversal components and magnetic memory, can solve problems that have not been clarified, and achieve the effect of reducing the reversal current density

Active Publication Date: 2019-03-05
TDK CORPARATION
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, even a pure spin current via the Rashba effect at the interface of dissimilar materials induces a magnetization reversal induced by the same SOT
However, the mechanisms of these

Method used

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  • Spin current magnetization reversal element and magnetic memory
  • Spin current magnetization reversal element and magnetic memory
  • Spin current magnetization reversal element and magnetic memory

Examples

Experimental program
Comparison scheme
Effect test

no. 1 Embodiment approach

[0047] figure 1 It is a diagram schematically showing the structure of the spin current magnetization reversal element 100 according to the first embodiment of the present invention, and the spin current magnetization reversal element 100 includes: a first ferromagnetic metal layer capable of changing the direction of magnetization 101. A spin-orbit torque wiring layer 102 bonded to one surface of the first ferromagnetic metal layer 101 and extending in a direction intersecting the normal direction (z direction) of the first ferromagnetic metal layer 101 . Here, a case where the spin-orbit torque wiring layer 102 extends in a direction (x direction) perpendicular to the normal direction of the first ferromagnetic metal layer 101 is exemplified.

[0048] figure 1 (a) is a plan view when the spin current magnetization inversion element 100 is viewed from the first ferromagnetic metal layer 101 side. figure 1 (b) is a cross-sectional view when the spin current magnetization rev...

no. 2 Embodiment approach

[0076] image 3 It is a perspective view schematically showing the structure of the spin current magnetization reversal element 200 according to the second embodiment of the present invention. The spin current magnetization reversal element 200 is formed by sequentially stacking the first ferromagnetic metal layer 201, the nonmagnetic layer 203, the second ferromagnetic metal layer 204, and the wiring layer 205 on the spin-orbit torque wiring layer 202. . It further includes a first power source 207 for flowing current in the lamination direction D1 of the magnetoresistance effect element 206 composed of the above three layers 201, 203, and 204, and a first power supply 207 for flowing current in the longitudinal direction of the spin-orbit torque wiring layer 202. The second power source 208 flowing through D2. The magnetoresistance effect element 206 is supported by the substrate 209 via the wiring layer 205 .

[0077] The spin current magnetization inversion element 200 ca...

Embodiment 1

[0124] A magnetoresistance effect element including the spin current magnetization inversion element of the present invention was produced by the method described above. First, after forming the base layer on the base substrate by the sputtering method, the spin-orbit torque wiring made of Pt is formed by the sputtering method using Ar while irradiating Ar ions using the ion gun assist method. Floor. Continuing with the ion implantation method, B (10 atm%) as a light element was added to the processed spin-orbit torque wiring layer.

[0125] Next, a first ferromagnetic metal layer, a nonmagnetic layer, and a second ferromagnetic metal layer are sequentially stacked on the spin-orbit torque wiring layer containing light element B and rare gas element Ar by sputtering to form Functional part of the magnetoresistive element. CoFeB was used as the material of the first ferromagnetic metal layer. As the non-magnetic material, MgO was used. As the material of the second ferromag...

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Abstract

A spin flow magnetization reversal element (100) includes a first ferromagnetic metal layer (101) capable of changing a direction of magnetization; a spin orbit torque wiring layer (102) joined to thefirst ferromagnetic metal layer (101) and extending in a direction intersecting a direction perpendicular to a plane of the first ferromagnetic metal layer (101). The spin orbit torque wiring layer (102) includes at least one light element L among B, C, Si and P and at least one noble gas element among Ar, Kr and Xe.

Description

technical field [0001] The present invention relates to a spin current magnetization reversal element and a magnetic memory. [0002] This application claims priority to Japanese Patent Application No. 2017-168935 filed on September 1, 2017, and uses the content here. Background technique [0003] A giant magnetoresistance (GMR: Giant MagnetoResistance) element composed of a multilayer film of a ferromagnetic layer and a nonmagnetic layer, and a tunnel using an insulating layer (tunnel barrier layer, barrier layer) in the nonmagnetic layer are known. Magnetoresistive (TMR) elements. In general, a TMR element has a higher element resistance than a GMR element and its magnetoresistance (MR) ratio is greater than that of a GMR. Therefore, TMRs are attracting attention as elements for magnetic sensors, high-frequency components, magnetic heads, and nonvolatile random access memories (MRAM). [0004] When the magnetization directions of the two ferromagnetic layers sandwiching...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L43/08H01L43/06H01L43/14H01L27/22H10N50/10H10N50/80H10N50/01H10N52/00H10N52/01
CPCH10B61/00H10N52/00H10N52/01H10N50/10H10N50/85G11C11/1675G11C11/161G11C11/18H10N50/80H10N50/01
Inventor 盐川阳平佐佐木智生
Owner TDK CORPARATION