A nanowire-coupled quantum dot structure and its preparation method
A technology of quantum dots and nanowires, applied in the field of nanowire-coupled quantum dot structures and their preparation, can solve the problems of not being a three-dimensional strongly confined structure, unavoidable epitaxy of the tip sidewall, and the lateral size of quantum dots depending on diameter, etc. The effect of the limiting effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0036] The present invention will be further elaborated below through specific embodiments in conjunction with the accompanying drawings.
[0037] The preparation method of the nanowire-coupled quantum dot structure of this embodiment includes the following steps:
[0038] 1) Determine the size and material of the reconstructed quantum dot structure, including the period number of the quantum dot structure, the bottom potential barrier, the material and thickness (longitudinal dimension) of the quantum dot and top potential barrier.
[0039] 2) Si(111) is selected as the growth substrate 1, on which N-polar nitride nanowires can be grown, wherein the top crystal plane of the nanowire is the N-polar plane, and the thermal stability of the N-polar plane is greater than that of the non-polar sidewall. sex crystal facet.
[0040] 3) Growing vertically oriented nanowires on a growth substrate to form a nanowire substrate:
[0041] Using molecular beam epitaxy to grow 1 μm N-polar...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 


