Penning ion source based on hollow cathode discharge

A hollow cathode discharge, Penning ion source technology, applied in discharge tubes, ion beam tubes, circuits, etc., can solve the problems of affecting ion source insulation, easy pollution, coating pollution, etc., to increase the effective movement stroke, reduce Contamination, improve stability effect

Active Publication Date: 2019-04-23
嘉兴艾钛科纳米科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the gap between the anode and the cathode of the ion source on the anode layer is small, and the coating device is easily polluted, which affects the insulation of the ion source. At the same time, there is ablation corrosion on the cathode, which is easy to pollute the coating.

Method used

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  • Penning ion source based on hollow cathode discharge
  • Penning ion source based on hollow cathode discharge
  • Penning ion source based on hollow cathode discharge

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0040] see Figure 4.1 As shown: the magnetic field of the magnetic pole 13 is a single-polarity magnetic field formed by permanent magnets, and the single-polarity magnetic field is a magnetic group formed by magnets of the same polarity that is set on the anode cylinder 132, and its magnetic field direction is parallel to the axial direction Under the action of a single polar magnetic field, the electrons move spirally under the influence of the magnetic field, which increases the effective stroke in the discharge chamber of the anode cylinder, increases the number of collisions with the process gas, and generates more electrons at the same time.

[0041] see Figure 6 Shown:

[0042] The hollow cathode plate 17 is provided with a plurality of groups of holes 01, the hollow cathode plate 17 and the cathode grid 12 are applied with the negative voltage of the same potential, the anode cylinder 11 is loaded with positive electricity, and the accelerating pole 18 is loaded wit...

Embodiment 2

[0049] The difference between the magnetic poles of this embodiment and the first embodiment is that the magnetic field of the magnetic pole 13 is an electromagnetic coil, which provides a stable and controllable electromagnetic field for the electron source. The electromagnetic coil is a conventional single-phase wound electromagnetic coil, on which various waveforms such as sine, cosine, square wave, and triangle wave can be applied, and a load with adjustable frequency and current can be formed in the anode cylinder 11 correspondingly. With a certain oscillating magnetic field, the movement of electrons in the oscillating magnetic field can further increase the effective movement distance compared with a single polarity magnetic field, and can collide with more process gases to generate more electrons.

[0050] see Figure 4.2 As shown: the magnetic field of the magnetic pole 13 is the magnetic field of the electromagnetic coil formed by the permanent magnet. The magnetic g...

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PUM

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Abstract

The invention discloses a Penning ion source based on hollow cathode discharge. The Penning ion source comprises an anode cylinder, a cathode screen, a magnetic pole, an insulating sleeve, a cathode seat, an air inlet hole, a hollow cathode plate, an acceleration pole and a ceramic sleeve. The Penning ion source mainly employs multiple holes on the hollow cathode plate to perform electron collection in the glow discharge process to generate a hollow cathode effect to form Penning discharge with the anode cylinder and the cathode screen, the electrons can achieve reciprocatory motion under theeffects of the electric field and the magnetic field, the moving distances of the electrons are greatly prolonged, more electrons are generated through collision, a large beam of particle flows are output into a vacuum chamber caused by the acceleration of an acceleration pole, wherein the cathode seat and the anode cylinder are internally provided with water-cooling chambers to effectively generate heat in the discharge process, and the ceramic sleeve with a lot of micro-hole can achieve stabilization of the air intake airflow. The Penning discharge is combined with the hollow cathode discharge to achieve uniform and stable discharge and a better cooling effect so as to improve the long-term and efficient stability of the ion source.

Description

technical field [0001] The invention relates to a Penning ion source, in particular to a Penning ion source based on hollow cathode discharge. Background technique [0002] The ion source is the most widely used ion-assisted deposition at this stage, and a device that discharges ionized gas through plasma during the vapor deposition process of cleaning the product to be plated. The ion source can effectively improve the density and adhesion of the film layer, as well as the optical and mechanical properties of the film layer. The commonly used ion sources at this stage mainly include Penning ion source, Hall ion source, and anode layer ion source. [0003] The Penning ion source is an ion source designed on the basis of Penning discharge. By applying a magnetic field in the axial direction of the annular anode, the electrons move back and forth between the two cathodes to increase the ionization rate of gas particles. The Penning ion source The principle causes the structu...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J27/04H01J27/02
CPCH01J27/022H01J27/04
Inventor 郎文昌
Owner 嘉兴艾钛科纳米科技有限公司
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