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Penning Ion Source Based on Thermionic Discharge

A Penning ion source and hot electron technology, applied in discharge tubes, ion beam tubes, circuits, etc., can solve problems such as coating pollution, easy pollution, and affecting the insulation of ion sources, achieving efficient cooling, reducing sputtering, The effect of increasing the effective range of motion

Active Publication Date: 2021-12-14
WENZHOU POLYTECHNIC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the gap between the anode and the cathode of the ion source on the anode layer is small, and the coating device is easily polluted, which affects the insulation of the ion source. At the same time, there is ablation corrosion on the cathode, which is easy to pollute the coating.

Method used

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  • Penning Ion Source Based on Thermionic Discharge
  • Penning Ion Source Based on Thermionic Discharge
  • Penning Ion Source Based on Thermionic Discharge

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0041] see Figure 4.1 As shown: the magnetic field of the magnetic pole 14 is a single-polarity magnetic field formed by permanent magnets, and the single-polarity magnetic field is a magnetic group formed by magnets of the same polarity that is set on the anode cylinder 132, and its magnetic field direction is parallel to the axial direction Under the action of a single polar magnetic field, the electrons move spirally under the influence of the magnetic field, which increases the effective stroke in the anode cylinder discharge chamber 104, increases the number of collisions with the process gas, and generates more electrons at the same time.

[0042] see Figure 7 As shown: the tungsten wire 110 on the two electrodes of the hot wire electrode assembly in the circular electron source 1 applies low voltage and high current (direct current, alternating current), the tungsten wire is heated, and the kinetic energy of the electrons in the tungsten wire increases. When the elec...

Embodiment 2

[0049] The difference between the magnetic poles of this embodiment and the first embodiment is that the magnetic field of the magnetic pole 14 is an electromagnetic coil, which provides a stable and controllable electromagnetic field for the electron source. The electromagnetic coil is a conventional single-phase wound electromagnetic coil, on which various waveforms such as sine, cosine, square wave, and triangle wave can be applied, and a load with adjustable frequency and current can be formed in the anode cylinder 132 correspondingly. With a certain oscillating magnetic field, the movement of electrons in the oscillating magnetic field can further increase the effective movement distance compared with a single polarity magnetic field, and can collide with more process gases to generate more electrons.

[0050] see Figure 4.2 As shown: the magnetic field of the magnetic pole 14 is the magnetic field of the electromagnetic coil formed by the permanent magnet. The magnetic ...

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Abstract

The invention discloses a Penning ion source based on thermal electron discharge, which includes: a hot wire electrode assembly, a discharge chamber, an insulating sleeve, an anode cylinder assembly, a cathode net, an accelerating pole, and a magnetic pole. After the component is conductive and heated, a hot wire discharge occurs, and a Penning discharge is formed between the anode cylinder and the cathode grid. The electrons realize reciprocating motion under the action of the electric field and magnetic field in the discharge chamber and the anode cylinder, and the movement distance of the electrons is greatly reduced. The number of effective collisions increases exponentially, and is accelerated by the accelerating pole to output a large beam of particle flow into the vacuum chamber. There are three water-cooled chambers in the hot wire electrode assembly and the discharge chamber, which can efficiently cool the hot wire discharge. The heat generated in the process; the present invention has the following advantages and effects: the present invention realizes uniform and stable discharge by combining Penning discharge with hot wire discharge, and can have better cooling effect, improving the long-term high-efficiency and stability of the ion source sex.

Description

technical field [0001] The invention relates to a Penning ion source, in particular to a Penning ion source based on thermal electron discharge. Background technique [0002] The ion source is the most widely used ion-assisted deposition at this stage, and a device that discharges ionized gas through plasma during the vapor deposition process of cleaning the product to be plated. The ion source can effectively improve the density and adhesion of the film layer, as well as the optical and mechanical properties of the film layer. The commonly used ion sources at this stage mainly include Penning ion source, Hall ion source, and anode layer ion source. [0003] The Penning ion source is an ion source designed on the basis of Penning discharge. By applying a magnetic field in the axial direction of the annular anode, the electrons move back and forth between the two cathodes to increase the ionization rate of gas particles. The Penning ion source The principle causes the struc...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J27/04
Inventor 郎文昌
Owner WENZHOU POLYTECHNIC
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