A capacitor film cleaning device using centrifugal force to prevent overlapping

Abstract

The invention discloses a capacitor film cleaning device which utilizes centrifugal force to prevent overlapping. The structure includes a processing chamber, an auxiliary chamber, an ultrasonic wave, an anti-overlapping device, an active rotating shaft, an observation window and a supporting seat. The invention uses the force of the electromagnet on the armature to make the limiting plate and the clamping piston clamp the film, and uses the active rotating shaft to drive the fixed frame and the film to rotate at a uniform speed, so that the film is scattered around by the centrifugal force to form an arc paddle wheel shape, preventing Due to the tension of the water, the films are attached to each other, increasing the cleaning dead angle, and the main rod uses the deformation resistance of the torsion spring to hinder its rotation driven by the film friction, so that the wiping sleeve moves at a speed lower than the film rotation, which is consistent with The film forms a relative movement, wipes and cleans the surface of the film, and at the same time uses the diversion of the blocking block and the branch channel to increase the airflow into the main road, and then sprays tiny air bubbles from the nozzle to promote the generation of cavitation effect and improve the performance of the film. cleaning efficiency and effectiveness.

Description

technical field [0001] The invention relates to the field of cleaning equipment, more specifically, a capacitor film cleaning equipment that utilizes centrifugal force to prevent overlapping. Background technique [0002] With the advancement of science and technology, the upgrading of electronics, home furnishing, communication and other industries is getting faster and faster, and film capacitors have become indispensable electronic components due to their good electrical performance and high reliability. In order to ensure their performance, they are being manufactured Previously, it was necessary to clean the polystyrene film of the capacitor. At present, ultrasonic cleaning is mostly used for vibration cleaning. The existing traditional technology is not comprehensive, and has the following disadvantages: [0003] When cleaning, the polystyrene film is put into the cleaning chamber, and then through the ultrasonic cavitation effect, the polystyrene film is flipped and v...

AI Technical Summary

Problems solved by technology

[0004] Aiming at the deficiencies in the prior art, the purpose of the present invention is to provide a capacitor film cleaning device that utilizes centrifugal force to prevent overlapping, so as to solve the problem of prior art that the polystyrene film is placed inside the cleaning chamber and then ultrasonic waves are used to clean the capacitor film. Cavitation effect, the polystyrene film is flipped and vibrated, and the polystyrene films collide with each other during the flip, but the impact strength of the polystyrene film itself is low, and it is easy to be damaged by force, and the polystyrene film does not Heat resistance, and when the temperature of ultrasonic cleaning is low, the effect of cavitation effect is small. At this time, the surface is completely washed by the accelerated water flow to clean the polystyrene film, and the polystyrene film will be affected by the water tension in water. Bonding together, resulting in less thorough cleaning and reducing the defects in the electrical properties of the processed capacitors

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