A process for shortening the diffusion time of three diffusers
A diffusion time and diffusion sheet technology, which is applied in the manufacture of electrical components, circuits, semiconductors/solid-state devices, etc., can solve the problems of low diffusion efficiency and long diffusion time of diffusion sheets, and achieve the effect of improving diffusion efficiency and shortening diffusion time
Active Publication Date: 2021-12-14
TIANJIN HUANXIN TECH DEV
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Problems solved by technology
The one-time diffusion process makes the diffusion time of the diffusion sheet long during diffusion, reaching 130-150h, and the diffusion efficiency is low
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[0035] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.
[0036] like figure 1 As shown, the present invention relates to a process for shortening the diffusion time of the three diffusion sheets, shortening the diffusion time of the diffusion sheets, and improving the diffusion efficiency. The process of shortening the diffusion time of the three-diffusion sheet specifically includes the following steps:
[0037] s1: Clean the diffusion sheet with cleaning solution for several times: Clean the diffusion sheet with cleaning solution, and perform cleaning twice here. Cleaning solution SC1 is used for the first cleaning with cleaning solution. Ammonia, hydrogen peroxide and deionized water mixed in volume ratio, where the volume ratio of ammonia, hydrogen peroxide and deionized water is 550-750ml: 1.2-1.4L: 5-7L, when using the cleaning solution SC1 to clean the diffuser , the temperature of the clean...
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The invention provides a process for shortening the diffusion time of three diffusion sheets, which includes the following steps: placing the cleaned diffusion sheet in a container for pre-diffusion and placing the sheet, putting the cleaned diffusion sheet into a pre-diffusion furnace for pre-diffusion Diffusion, the diffusion sheet after pre-diffusion is entered into the main diffusion furnace for main diffusion, the diffusion sheet after the main diffusion is processed after the main diffusion, and the diffusion sheet after the main diffusion post-treatment is subjected to secondary diffusion in the pre-diffusion furnace Pre-diffusion, the second main diffusion is carried out in the main diffusion furnace for the diffusion sheet which has completed the second pre-diffusion, and the furnace test is carried out for the diffusion sheet after the second main diffusion is completed. The beneficial effect of the present invention is that pre-diffusion and main diffusion are performed on the diffusion sheet twice, which can greatly shorten the diffusion time of the diffusion sheet, so that the main diffusion time of the diffusion sheet is shortened from the original 130-150h to 70-90h, improving the diffusion efficiency.
Description
technical field [0001] The invention belongs to the technical field of semiconductor wafer manufacturing, and in particular relates to a process for shortening the diffusion time of three diffusion sheets. Background technique [0002] The conventional phosphorus diffusion method mainly includes the following steps: (1) high-temperature phosphorus diffusion, the diffusion temperature is usually 840-860°C; (2) constant-temperature propulsion, the propulsion temperature is usually 840-860°C. The one-time diffusion process makes the diffusion time of the diffusion sheet long during diffusion, reaching 130-150h, and the diffusion efficiency is low. Contents of the invention [0003] The problem to be solved by the present invention is to provide a process for shortening the diffusion time of the three-diffusion sheet, which is especially suitable for use in the diffusion of semiconductor silicon wafers. The diffusion sheet is subjected to two pre-diffusion and main diffusion, ...
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IPC IPC(8): H01L21/223H01L21/324
Inventor 黄志焕李亚哲徐长坡陈澄梁效峰杨玉聪王晓捧
Owner TIANJIN HUANXIN TECH DEV